{"title":"寄生条纹电容对下搭接DG-MOSFET阈值电压的影响","authors":"P. Verma, Ashutosh Nandi","doi":"10.1109/I2C2.2017.8321915","DOIUrl":null,"url":null,"abstract":"A compact model for the effect of parasitic fringe capacitance on the threshold voltage of a gate to source/drain (S/D) underlapped double-gate (DG)-MOSFET is developed. The authors' model includes the effects of channel thickness, oxide thickness and dielectric constant of a MOSFET structure. A simple expression is derived for the fringe capacitance and the threshold voltage. In this model, we show the effect of fringe capacitance on the threshold voltage by varying the channel thickness, oxide thickness, and dielectric constant.","PeriodicalId":288351,"journal":{"name":"2017 International Conference on Intelligent Computing and Control (I2C2)","volume":"41 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effects of parasitic fringe capacitance on threshold voltage of underlap DG-MOSFET\",\"authors\":\"P. Verma, Ashutosh Nandi\",\"doi\":\"10.1109/I2C2.2017.8321915\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A compact model for the effect of parasitic fringe capacitance on the threshold voltage of a gate to source/drain (S/D) underlapped double-gate (DG)-MOSFET is developed. The authors' model includes the effects of channel thickness, oxide thickness and dielectric constant of a MOSFET structure. A simple expression is derived for the fringe capacitance and the threshold voltage. In this model, we show the effect of fringe capacitance on the threshold voltage by varying the channel thickness, oxide thickness, and dielectric constant.\",\"PeriodicalId\":288351,\"journal\":{\"name\":\"2017 International Conference on Intelligent Computing and Control (I2C2)\",\"volume\":\"41 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 International Conference on Intelligent Computing and Control (I2C2)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/I2C2.2017.8321915\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 International Conference on Intelligent Computing and Control (I2C2)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/I2C2.2017.8321915","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Effects of parasitic fringe capacitance on threshold voltage of underlap DG-MOSFET
A compact model for the effect of parasitic fringe capacitance on the threshold voltage of a gate to source/drain (S/D) underlapped double-gate (DG)-MOSFET is developed. The authors' model includes the effects of channel thickness, oxide thickness and dielectric constant of a MOSFET structure. A simple expression is derived for the fringe capacitance and the threshold voltage. In this model, we show the effect of fringe capacitance on the threshold voltage by varying the channel thickness, oxide thickness, and dielectric constant.