D. Wilt, R. Thomas, S. Bailey, D. Brinker, F.L. DeAngelo, N. Fatemi, G. Landis
{"title":"剥膜砷化镓太阳能电池的发展","authors":"D. Wilt, R. Thomas, S. Bailey, D. Brinker, F.L. DeAngelo, N. Fatemi, G. Landis","doi":"10.1109/PVSC.1990.111601","DOIUrl":null,"url":null,"abstract":"Thin-film, single-crystal gallium arsenide (GaAs) solar cells could exhibit a specific power approaching 700 W/kg including coverglass. A simple process has been described whereby epitaxial GaAs layers are peeled from a reusable substrate. This process takes advantage of the extreme selectivity (>10/sup 6/) of the etching rate of aluminum arsenide (AlAs) over GaAs in dilute hydrofluoric acid (HF). The feasibility of using the peeled film technique to fabricate high-efficiency, low-mass GaAs solar cells is presently demonstrated. A peeled film GaAs solar cell was successfully produced. The device, although fractured and missing the aluminum gallium arsenide (Al/sub x/Ga/sub 1-x/As) window and antireflective (AR) coating, has a V/sub oc/ of 874 mV and a fill factor of 68% under AM0 illumination.<<ETX>>","PeriodicalId":211778,"journal":{"name":"IEEE Conference on Photovoltaic Specialists","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"Peeled film GaAs solar cell development\",\"authors\":\"D. Wilt, R. Thomas, S. Bailey, D. Brinker, F.L. DeAngelo, N. Fatemi, G. Landis\",\"doi\":\"10.1109/PVSC.1990.111601\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Thin-film, single-crystal gallium arsenide (GaAs) solar cells could exhibit a specific power approaching 700 W/kg including coverglass. A simple process has been described whereby epitaxial GaAs layers are peeled from a reusable substrate. This process takes advantage of the extreme selectivity (>10/sup 6/) of the etching rate of aluminum arsenide (AlAs) over GaAs in dilute hydrofluoric acid (HF). The feasibility of using the peeled film technique to fabricate high-efficiency, low-mass GaAs solar cells is presently demonstrated. A peeled film GaAs solar cell was successfully produced. The device, although fractured and missing the aluminum gallium arsenide (Al/sub x/Ga/sub 1-x/As) window and antireflective (AR) coating, has a V/sub oc/ of 874 mV and a fill factor of 68% under AM0 illumination.<<ETX>>\",\"PeriodicalId\":211778,\"journal\":{\"name\":\"IEEE Conference on Photovoltaic Specialists\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-05-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Conference on Photovoltaic Specialists\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PVSC.1990.111601\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Conference on Photovoltaic Specialists","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.1990.111601","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Thin-film, single-crystal gallium arsenide (GaAs) solar cells could exhibit a specific power approaching 700 W/kg including coverglass. A simple process has been described whereby epitaxial GaAs layers are peeled from a reusable substrate. This process takes advantage of the extreme selectivity (>10/sup 6/) of the etching rate of aluminum arsenide (AlAs) over GaAs in dilute hydrofluoric acid (HF). The feasibility of using the peeled film technique to fabricate high-efficiency, low-mass GaAs solar cells is presently demonstrated. A peeled film GaAs solar cell was successfully produced. The device, although fractured and missing the aluminum gallium arsenide (Al/sub x/Ga/sub 1-x/As) window and antireflective (AR) coating, has a V/sub oc/ of 874 mV and a fill factor of 68% under AM0 illumination.<>