用弱背景脉冲控制电镀过程

{"title":"用弱背景脉冲控制电镀过程","authors":"V. Zarembo, D. Zarembo","doi":"10.1063/5.0075546","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":445579,"journal":{"name":"PROCEEDINGS OF THE 16TH INTERNATIONAL CONFERENCE ON INDUSTRIAL MANUFACTURING AND METALLURGY (ICIMM 2021)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Control of electroplating process by weak background pulses\",\"authors\":\"V. Zarembo, D. Zarembo\",\"doi\":\"10.1063/5.0075546\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":445579,\"journal\":{\"name\":\"PROCEEDINGS OF THE 16TH INTERNATIONAL CONFERENCE ON INDUSTRIAL MANUFACTURING AND METALLURGY (ICIMM 2021)\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"PROCEEDINGS OF THE 16TH INTERNATIONAL CONFERENCE ON INDUSTRIAL MANUFACTURING AND METALLURGY (ICIMM 2021)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1063/5.0075546\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"PROCEEDINGS OF THE 16TH INTERNATIONAL CONFERENCE ON INDUSTRIAL MANUFACTURING AND METALLURGY (ICIMM 2021)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/5.0075546","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}