用于硅片线缺陷检测的二维曲线形状基元

D. Sikka
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引用次数: 5

摘要

提出了一套新的二维曲线形状基元,用于半导体制造中圆片线缺陷的检测。一个基于监督学习的神经网络整合了这些形状基元,并在英特尔制造实验室超过6个月的真实数据上进行了测试。结果表明,新的形状基元集在捕获线形缺陷方面非常准确。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Two dimensional curve shape primitives for detecting line defects in silicon wafers
A new set of two-dimensional curve shape primitives for detecting line defects on wafers in semiconductor manufacturing is presented. A supervised learning based neural network which incorporates these shape primitives has been built and tested on more than six months of real data from an Intel fabrication laboratory. Results demonstrate that the new set of shape primitives was very accurate in capturing the line defects.<>
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