{"title":"高品质的1-V约瑟夫逊系列阵列在KRISS开发","authors":"Se Ii Park, Kyu-Tae Kim, R. Lee","doi":"10.1109/CPEM.1994.333431","DOIUrl":null,"url":null,"abstract":"By combining the selective niobium anodization process (SNAP) and the image reversal technique (IRT) a new fabrication process of integrated Josephson series array has been developed at KRISS. The array containing 2520 Nb/Al/sub 2/O/sub 3//Nb tunnel junctions produced stable quantized voltage steps up to 2 V with stability times of more than 5-h.<<ETX>>","PeriodicalId":388647,"journal":{"name":"Proceedings of Conference on Precision Electromagnetic Measurements Digest","volume":"193 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A high quality 1-V Josephson series array developed at KRISS\",\"authors\":\"Se Ii Park, Kyu-Tae Kim, R. Lee\",\"doi\":\"10.1109/CPEM.1994.333431\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"By combining the selective niobium anodization process (SNAP) and the image reversal technique (IRT) a new fabrication process of integrated Josephson series array has been developed at KRISS. The array containing 2520 Nb/Al/sub 2/O/sub 3//Nb tunnel junctions produced stable quantized voltage steps up to 2 V with stability times of more than 5-h.<<ETX>>\",\"PeriodicalId\":388647,\"journal\":{\"name\":\"Proceedings of Conference on Precision Electromagnetic Measurements Digest\",\"volume\":\"193 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1994-06-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of Conference on Precision Electromagnetic Measurements Digest\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CPEM.1994.333431\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of Conference on Precision Electromagnetic Measurements Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CPEM.1994.333431","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A high quality 1-V Josephson series array developed at KRISS
By combining the selective niobium anodization process (SNAP) and the image reversal technique (IRT) a new fabrication process of integrated Josephson series array has been developed at KRISS. The array containing 2520 Nb/Al/sub 2/O/sub 3//Nb tunnel junctions produced stable quantized voltage steps up to 2 V with stability times of more than 5-h.<>