磁盘抛光,减少头部磨损

Y. Kawakubo, S. Miyazawa, K. Kobayashi, S. Kobatake, S. Nakazawa
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引用次数: 2

摘要

磁盘抛光已被纳入作为磁盘表面抛光的最后过程,以减少粗糙度高度。我们认为,磁盘抛光也必须减少头部磨损。传统上,有两种抛光技术,“头抛光”(HB)和“带抛光”(TB)。我们提出了一种使用硬质球形滑块的“接触抛光”(CB)抛光技术。在本文中,我们展示了CB和TB对降低磁头磨损的影响,并对未来磁盘抛光研究的方向进行了展望。我们比较了有和没有CB和TB的磁盘表面销磨损情况。两种技术都减少了针的磨损。然而,它们对磨损率的降低不足以实现零磨损。我们认为在保持磁盘表面质量的同时,还应进一步研究TB和CB,以提高降低粗糙度高度的效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Disk burnishing for head wear reduction
Disk burnishing has been incorporated as a final process of disk surface finishing for reducing asperity height. We considered that disk burnishing must also reduce head wear. Conventionally, there have been two burnishing techniques, "Head Burnishing" (HB) and "Tape Burnishing" (TB). We proposed a burnishing technique, "Contact Burnishing" (CB) that used hard spherical sliders. In this paper, we show the effects of CB and TB on reducing head wear and close with the future direction for disk burnishing study. We compared pin wear on disk surfaces with and without CB and TB. Pin wear was reduced by both techniques. However, the wear rate decrease by them was not enough to realize zero wear. We consider TB and CB should be studied further to increase the asperity height reduction efficiency while maintaining disk surface quality.
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