在130 nm批量工艺中,α-SER降低1/100,最大限度地减少面积,功耗和延迟开销

Ryuichi Nakajima, Kazuya Ioki, J. Furuta, Kazutoshi Kobayashi
{"title":"在130 nm批量工艺中,α-SER降低1/100,最大限度地减少面积,功耗和延迟开销","authors":"Ryuichi Nakajima, Kazuya Ioki, J. Furuta, Kazutoshi Kobayashi","doi":"10.1109/IOLTS56730.2022.9897814","DOIUrl":null,"url":null,"abstract":"We examined the radiation hardness of the several types of flip-flops fabricated in a 130 nm bulk process by alpha-ray irradiation tests and circuit simulation. The simulated $\\alpha -$SER of FFs with the critical charge larger than 14 fC becomes 1/100 of that with the critical charge of 10 fC. We propose a radiation-hardened flip-flop minimizing area, delay, and power overheads with 1/100 lower $\\alpha -$SER in a 130 nm bulk process. The radiation hardness is achieved by adding series transistors and wires with only less than 14% area, 7% delay, and 12% power overheads in order to increase the critical charge. Alpha-ray irradiation tests revealed that the proposed method can reduce soft error rates to 1/100.","PeriodicalId":274595,"journal":{"name":"2022 IEEE 28th International Symposium on On-Line Testing and Robust System Design (IOLTS)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Radiation Hardened Flip-Flops Minimizing Area, Power, and Delay Overheads with 1/100 Lower α-SER in a 130 nm Bulk Process\",\"authors\":\"Ryuichi Nakajima, Kazuya Ioki, J. Furuta, Kazutoshi Kobayashi\",\"doi\":\"10.1109/IOLTS56730.2022.9897814\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We examined the radiation hardness of the several types of flip-flops fabricated in a 130 nm bulk process by alpha-ray irradiation tests and circuit simulation. The simulated $\\\\alpha -$SER of FFs with the critical charge larger than 14 fC becomes 1/100 of that with the critical charge of 10 fC. We propose a radiation-hardened flip-flop minimizing area, delay, and power overheads with 1/100 lower $\\\\alpha -$SER in a 130 nm bulk process. The radiation hardness is achieved by adding series transistors and wires with only less than 14% area, 7% delay, and 12% power overheads in order to increase the critical charge. Alpha-ray irradiation tests revealed that the proposed method can reduce soft error rates to 1/100.\",\"PeriodicalId\":274595,\"journal\":{\"name\":\"2022 IEEE 28th International Symposium on On-Line Testing and Robust System Design (IOLTS)\",\"volume\":\"8 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-09-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE 28th International Symposium on On-Line Testing and Robust System Design (IOLTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IOLTS56730.2022.9897814\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE 28th International Symposium on On-Line Testing and Robust System Design (IOLTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IOLTS56730.2022.9897814","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

采用α射线辐照试验和电路模拟的方法,研究了在130纳米体工艺中制备的几种类型人字拖的辐射硬度。临界电荷大于14 fC时的模拟$\alpha -$SER为临界电荷为10 fC时的1/100。我们提出了一种抗辐射触发器,在130纳米批量工艺中,将面积、延迟和功耗开销降至最小,降低了1/100的$\alpha -$SER。辐射硬度是通过增加串联晶体管和导线来实现的,只有小于14%的面积,7%的延迟和12%的功率开销,以增加临界电荷。α射线辐照试验表明,该方法可将软错误率降低到1/100。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Radiation Hardened Flip-Flops Minimizing Area, Power, and Delay Overheads with 1/100 Lower α-SER in a 130 nm Bulk Process
We examined the radiation hardness of the several types of flip-flops fabricated in a 130 nm bulk process by alpha-ray irradiation tests and circuit simulation. The simulated $\alpha -$SER of FFs with the critical charge larger than 14 fC becomes 1/100 of that with the critical charge of 10 fC. We propose a radiation-hardened flip-flop minimizing area, delay, and power overheads with 1/100 lower $\alpha -$SER in a 130 nm bulk process. The radiation hardness is achieved by adding series transistors and wires with only less than 14% area, 7% delay, and 12% power overheads in order to increase the critical charge. Alpha-ray irradiation tests revealed that the proposed method can reduce soft error rates to 1/100.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信