利用改进离子波束-溅射方法制作高分辨率扫描电子显微镜(HRSEM)观察的样品

Journal of the Mineralogical Society of Japan Pub Date : 1999-05-31 DOI:10.2465/GKK1952.28.65

茂男滝沢, 良樹大野

{"title":"利用改进离子波束-溅射方法制作高分辨率扫描电子显微镜(HRSEM)观察的样品","authors":"茂男滝沢, 良樹大野","doi":"10.2465/GKK1952.28.65","DOIUrl":null,"url":null,"abstract":"Ion-beam sputtering deposition is very useful to a nonconductive specimen-preparation technique for ultra-high to high resolution electron microscopy. Application of the sputtering has modified the ion-beam thinning apparatus for preparation of the sample for TEM. Effective use of our modified sputtering apparatus leads to a good conductivity of the Pt-coating composed of finer particles in 1.7nm diamerter, and a surface of crystal can be closely observed under magnifi-cation of more than 100, 000.","PeriodicalId":242743,"journal":{"name":"Journal of the Mineralogical Society of Japan","volume":"54 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-05-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"改良イオンビーム・スパッタ法による高分解能走査電子顕微鏡(HRSEM)観察のための試料作成\",\"authors\":\"茂男滝沢, 良樹大野\",\"doi\":\"10.2465/GKK1952.28.65\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Ion-beam sputtering deposition is very useful to a nonconductive specimen-preparation technique for ultra-high to high resolution electron microscopy. Application of the sputtering has modified the ion-beam thinning apparatus for preparation of the sample for TEM. Effective use of our modified sputtering apparatus leads to a good conductivity of the Pt-coating composed of finer particles in 1.7nm diamerter, and a surface of crystal can be closely observed under magnifi-cation of more than 100, 000.\",\"PeriodicalId\":242743,\"journal\":{\"name\":\"Journal of the Mineralogical Society of Japan\",\"volume\":\"54 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-05-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of the Mineralogical Society of Japan\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.2465/GKK1952.28.65\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of the Mineralogical Society of Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2465/GKK1952.28.65","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

离子束溅射沉积是一种非常有用的用于超高分辨率到高分辨率电子显微镜的非导电样品制备技术。溅射的应用改进了用于制备TEM样品的离子束稀释装置。有效地利用我们改进的溅射装置，使得由直径为1.7nm的细小颗粒组成的pt涂层具有良好的导电性，并且在10万倍以上的放大倍率下可以近距离观察到晶体表面。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

改良イオンビーム・スパッタ法による高分解能走査電子顕微鏡(HRSEM)観察のための試料作成

Ion-beam sputtering deposition is very useful to a nonconductive specimen-preparation technique for ultra-high to high resolution electron microscopy. Application of the sputtering has modified the ion-beam thinning apparatus for preparation of the sample for TEM. Effective use of our modified sputtering apparatus leads to a good conductivity of the Pt-coating composed of finer particles in 1.7nm diamerter, and a surface of crystal can be closely observed under magnifi-cation of more than 100, 000.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Journal of the Mineralogical Society of Japan

自引率

0.00%

发文量