纳米CMOS工艺中块驱动亚阈值差分对的Gm增强

L. H. C. Ferreira, S. Sonkusale
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引用次数: 15

摘要

本文提出了一种在纳米CMOS工艺中提高块驱动亚阈值差分对跨导Gm的简单有效方法。这种方法基于一种正反馈源退化,它不依赖于几何参数或偏置电压,并导致直流增益和单位增益频率的改进值,而不增加功耗或改变其他特征。尽管差分对输出电阻可能发生变化,但弱反转差分对的直流增益和单位增益频率可以增加(n + 1)/(n - 1)倍(例如,在130纳米IBM CMOS工艺中增加13.72倍),这一因素随着缩放而改善,而许多其他器件特性则会降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Gm enhancement for bulk-driven sub-threshold differential pair in nanometer CMOS process
In this paper a simple and efficient way to enhance the transconductance Gm for bulk-driven sub-threshold differential pair in nanometer CMOS process is presented. This approach is based on a type of positive feedback source degeneration, which does not depend on geometry parameters or biasing voltages, and leads to improved values for the DC gain and the unity gain frequency, without increasing power consumption or changing other features. Despite of possible differential pair output resistance variation, the DC gain and the unity gain frequency of weak inversion differential pair can be increased by (n + 1)/(n - 1) times (e.g., 13.72 times in an 130-nm IBM CMOS process), a factor that improves with scaling while many other device characteristics degrade.
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