{"title":"光刻用超级透镜","authors":"Y. Zhang, Daohua Zhang, M. Fiddy","doi":"10.1109/AOM.2010.5713599","DOIUrl":null,"url":null,"abstract":"In this paper, we have examined the possibilityof using a planar negative index lens in lithography applications.We numerically studied the field patterns generated by a PEC and Cr mask propagating through a negative index slab to form a super-resolved image of the mask at the image plane. We discuss the advantages and disadvantages of this for next generation lithography.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"57 2","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Superlens for lithography\",\"authors\":\"Y. Zhang, Daohua Zhang, M. Fiddy\",\"doi\":\"10.1109/AOM.2010.5713599\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we have examined the possibilityof using a planar negative index lens in lithography applications.We numerically studied the field patterns generated by a PEC and Cr mask propagating through a negative index slab to form a super-resolved image of the mask at the image plane. We discuss the advantages and disadvantages of this for next generation lithography.\",\"PeriodicalId\":222199,\"journal\":{\"name\":\"Advances in Optoelectronics and Micro/nano-optics\",\"volume\":\"57 2\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advances in Optoelectronics and Micro/nano-optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/AOM.2010.5713599\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Optoelectronics and Micro/nano-optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/AOM.2010.5713599","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
In this paper, we have examined the possibilityof using a planar negative index lens in lithography applications.We numerically studied the field patterns generated by a PEC and Cr mask propagating through a negative index slab to form a super-resolved image of the mask at the image plane. We discuss the advantages and disadvantages of this for next generation lithography.
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