小电流应用专用工艺表征方法

Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002. Pub Date : 2002-04-08 DOI:10.1109/ICMTS.2002.1193168

W. Rahajandraibe, C. Dufaza, D. Auvergne, B. Cialdella, B. Majoux, V. Chowdhury

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引用次数: 0

摘要

本文提出了一种新的表征方法，专门用于模拟低功耗应用设计。提出了一种基于带隙参考电压的测试结构，该结构允许在电路工作点提取参数。该测试结构用于调整最终的SPICE参数，以校准芯片上电路各元件的电测量值。改进后的设计在硅上进行了仿真、测试和验证。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Low current application dedicated process characterization method

We present in this paper a new characterization method dedicated to an analog low consumption application design. A test structure, based on a bandgap reference voltage, that allows parameters extraction at the circuit operating point, is presented. This test structure is used to adjust the final SPICE parameters in order to calibrate the electrical measurement value of each component of the circuit on the chip. An improvement of the design is simulated, tested and validated on silicon.

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来源期刊

Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.

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