残余气体存在下纳米结构氮化硼薄膜的场致发射

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737) Pub Date : 2004-07-11 DOI:10.1109/IVNC.2004.1354923

P.A. Encarnacio, H. Goldberg, C. Deline, B. Gilchrist, J.L. Van Noord, R. Clarke

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引用次数: 1

摘要

本文从正在进行的多晶氮化硼(BN)薄膜的研究中，测量了不同气体的不同气氛下的场发射。初步结果表明，在氧气、氙、水蒸气和氮气等残余气体存在的情况下，纳米结构BN表面表现出强大的发射特性。此外，未观察到薄膜暴露于气体对发射特性的永久性影响。

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Field emission of nanostructured boron nitride thin films in the presence of residual gases

In this paper, field emission was measured in varying atmospheres of different gases, from an on-going study of thin films of polycrystalline boron nitride (BN). The initial results indicate that the nanostructured BN surface exhibit robust emission characteristics in the presence of residual gases such as oxygen, xenon, water vapor, and nitrogen. Also, no permanent effect on the emission characteristics was observed from the exposure of the films to the gas.

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Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)

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