大粗糙度表面的光谱椭偏测量

L. Melnichenko, B. B. Tytarchuk, I. A. Shaykevich
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引用次数: 1

摘要

光谱椭偏测量通常在光滑表面或粗糙度小的表面上进行。实际需要往往需要测量真实细节和产品的光学参数。这些细部和制品的表面不是镜面,而是非常粗糙,即Ra大于/等于λ。这项工作显示了在非常粗糙的表面上进行椭偏测量的可能性。提出了椭偏测量这些表面的方法,并对金属粗板和阳极氧化铝的半导体表面进行了研究。最常用的测量光谱椭偏参数的方法是比蒂法及其不同的修正。因此,我们正是为这种方法制定了我们自己的原则。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Spectroellipsometrical measurement of large roughness surface
Spectroellipsometrical measurements are usually made on smooth surfaces or surfaces with small roughness. Practical needs often demand measuring optical parameters of real details and products. The surface of these dtails and products is not mirror-like, but veyr rough, that is Ra greater than/equal to λ. This work shows possibility of ellipsometrical measurements on very rough surfaces. We proposed the method of ellipsometrical measurement of these surfaces and made investigations for metal rough plates and semiconductor surfaces of the anodized aluminum. The most common method of measurement of spectroellipsometrical parameters is the Beatty method and its different modifications. Therefore it is for this method that we work out our own principles.
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