垂直伪影校准的白光干涉法

V. Damian, M. Bojan, A. Sima, D. Cristea, A. Dinescu, R. Muller
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引用次数: 1

摘要

在本文中,我们描述了一种可追溯至米标准的方法来测量用作纳米技术和纳米科学观测仪器校准器的人工制品的高度。这个人工制品是一个特别制造的光栅,这样它的特征(高度、间距、宽度、墙角)在整个区域内是高度均匀的。利用白光干涉测量的原理,设计了用于纵向(垂直)测量的林尼克显微镜来确定光栅的高度。为了确保测量的可追溯性,使用了已知波长的激光源,并对使用白光获得的测量值进行了校准。对实验数据进行统计分析,估计测量精度在纳米范围内。将所得数据与蔡司显微镜下TIC法所得结果进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
White light interferometry for vertical artifact calibration
In this paper we describe a traceable to the meter standard method to measure the height of an artifact used as a calibrator for observation instruments in nanotechnologies and nanosciences. The artifact is a grating specially manufactured so that its features (height, pitch, width, wall angles) are highly uniform across its area. A Linnik microscope designed for longitudinal (vertical) measurements using the principle of white light interferometry was used to determine the height of the grating. To insure the traceability of the measurements a laser source of known wavelength was used and the measurements obtained using white light were calibrated to it. The experimental data was statistically analyzed and the measurement precision was estimated to be in the range of nanometers. The data were compared with the results obtained using the TIC method with a Carl Zeiss microscope.
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