150 GHz SiGe hbt中微波噪声源分析

P. Sakalas, Michael Schroter, R. F. Scholz, Hao Jiang, M. Racanelli
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引用次数: 7

摘要

在2-26 GHz频率范围内测量了150 GHz SiGe HBTs的偏置相关微波噪声特性。并与紧凑型双极晶体管HICUM进行了比较。对于噪声源的分析和分解,采用了基于HICUM的详细的小信号模型,并带有相应的参数。特别地,研究了各种噪声源和机制对最小噪声系数的影响。研究发现,SiGe中基极和集电极电流散粒噪声的相关性可以降低电流密度和频率范围内的NF/sub min/。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of microwave noise sources in 150 GHz SiGe HBTs
Bias dependent microwave noise characteristics of 150 GHz SiGe HBTs were measured in the 2-26 GHz frequency range. The characteristics are compared with the compact bipolar transistor model HICUM. For noise source analysis and decomposition, a detailed small-signal model with corresponding parameters is employed which is based on HICUM. In particular, the influence of the various noise sources and mechanisms on the minimum noise figure is investigated. Correlation between base and collector current shot noise in SiGe is found to reduce NF/sub min/ in the current density and frequency range of investigation.
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