266nm紫外波长下无掺杂PMMA mPOF Bragg光栅器件的制备

2019 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference (IMOC) Pub Date : 2019-11-10 DOI:10.1109/IMOC43827.2019.9317608

R. Min, B. Ortega, L. Pereira, T. Paixão, P. André, G. Woyessa, O. Bang, D. Zhong, P. Antunes, J. Pinto, C. Marques

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引用次数: 0

摘要

在266nm波长的低成本Nd:YAG激光器(与准分子激光器相比)制备的无掺杂PMMA POF中Bragg光栅器件在850nm区域具有较低的传输损耗。然后为潜在的应用提供温度，湿度和应变特性。

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Bragg grating device fabrication in undoped PMMA mPOF at 266 nm UV waveleng

We present the first results about Bragg grating devices in undoped PMMA POF fabricated with relative low cost Nd:YAG laser (when compared with excimer lasers) at 266 nm wavelength at low transmission loss in 850 nm region. Then temperature, humidity and strain characterizations are supplied for potential applications.

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来源期刊

2019 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference (IMOC)

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