{"title":"二极管激光光谱学在半导体加工中水分污染测量中的应用","authors":"J. Mcandrew, R. Inman, D. Znamnensky","doi":"10.1109/LEOSST.2000.869708","DOIUrl":null,"url":null,"abstract":"The applications of tunable diode laser absorption spectroscopy (TDLAS) to a variety of semiconductor process environments, including RTP, CVD and etch, are discussed. TDLAS has been demonstrated to be compatible with aggressive gases such as HCl, NH/sub 3/, SiH/sub 2/Cl/sub 2/, etc. and with strongly depositing atmospheres as in Si/sub 3/N/sub 4/ LPCVD. In addition, it has been shown to be capable of trace moisture measurements to 50 ppb in pure NH/sub 3/ and to 10 ppb in a variety of corrosive gases including HCl. These applications are discussed as are the key differences in approach required for in situ and for high-purity gas measurement.","PeriodicalId":415720,"journal":{"name":"2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)","volume":"106 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Application of diode laser spectroscopy for moisture contamination measurement in semiconductor processing\",\"authors\":\"J. Mcandrew, R. Inman, D. Znamnensky\",\"doi\":\"10.1109/LEOSST.2000.869708\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The applications of tunable diode laser absorption spectroscopy (TDLAS) to a variety of semiconductor process environments, including RTP, CVD and etch, are discussed. TDLAS has been demonstrated to be compatible with aggressive gases such as HCl, NH/sub 3/, SiH/sub 2/Cl/sub 2/, etc. and with strongly depositing atmospheres as in Si/sub 3/N/sub 4/ LPCVD. In addition, it has been shown to be capable of trace moisture measurements to 50 ppb in pure NH/sub 3/ and to 10 ppb in a variety of corrosive gases including HCl. These applications are discussed as are the key differences in approach required for in situ and for high-purity gas measurement.\",\"PeriodicalId\":415720,\"journal\":{\"name\":\"2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)\",\"volume\":\"106 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-07-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/LEOSST.2000.869708\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LEOSST.2000.869708","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Application of diode laser spectroscopy for moisture contamination measurement in semiconductor processing
The applications of tunable diode laser absorption spectroscopy (TDLAS) to a variety of semiconductor process environments, including RTP, CVD and etch, are discussed. TDLAS has been demonstrated to be compatible with aggressive gases such as HCl, NH/sub 3/, SiH/sub 2/Cl/sub 2/, etc. and with strongly depositing atmospheres as in Si/sub 3/N/sub 4/ LPCVD. In addition, it has been shown to be capable of trace moisture measurements to 50 ppb in pure NH/sub 3/ and to 10 ppb in a variety of corrosive gases including HCl. These applications are discussed as are the key differences in approach required for in situ and for high-purity gas measurement.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
