改进NbO2选择器特性,充分集成4F2 2x-nm技术1S1R ReRAM

S. Kim, T. J. Ha, S. Kim, Jae Yeon Lee, K. Kim, Jungho Shin, Yong Taek Park, S. P. Song, B. Kim, W. Kim, Jong Chul Lee, Hyun Sun Lee, Jong Hwang Song, E. Hwang, S. Cho, J. Ku, Jong Il Kim, Kyu Sung Kim, Jong-Hee Yoo, Hyo Jin Kim, Hoe Gwon Jung, Kee-jeung Lee, Suock Chung, Jong Kang, Jung Hoon Lee, H. Kim, S. Hong, G. Gibson, Yoocharn Jeon
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引用次数: 16

摘要

在本文中,作者报告了成功地开发了2x nm具有1S1R结构的交叉点ReRAM。1S1R 1/ 2vsw的断流是影响高密度ReRAM的关键因素之一。选择NbO2作为选择材料,采用上下阻挡层和间隔层材料的叠加工程改善了失流特性和成形特性。最后以选择器和电阻器材料的集成为特点进行了阵列操作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improvement of characteristics of NbO2 selector and full integration of 4F2 2x-nm tech 1S1R ReRAM
In this paper, the authors report that 2x nm cross-point ReRAM with 1S1R structure has been successfully developed. Off-current at 1/2 Vsw of 1S1R is one of key factor for high-density ReRAM. NbO2 was chosen as a selector material and off-current and forming characteristics were improved by using stack engineering of top and bottom barriers as well as spacer materials. Finally array operation was characterized with the integration of selector and resistor materials.
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