{"title":"二维异质结层间隧道FET (Thin-TFET):从理论到应用","authors":"Mingda Li, R. Yan, D. Jena, H. Xing","doi":"10.1109/IEDM.2016.7838451","DOIUrl":null,"url":null,"abstract":"We review the conception and development of two-dimensional heterojunction interlayer field effect transistor (Thin-TFET), where a steep subthreshold swing (SS) and a high on-current are estimated theoretically. The Thin-TFET has been experimentally demonstrated using WSe2/SnSe2 stacked heterostructures, where the SS is mostly likely limited by the interfacial trap density of states and the parasitic MOSFET. Due to its vertical stacking structure, Thin-TFET intrinsically has a smaller gate-drain capacitance compared to the conventional lateral pin-TFET. In turn, this results in mitigated Miller Effect in Thin-TFET thus reducing dynamic energy dissipation in circuits.","PeriodicalId":186544,"journal":{"name":"2016 IEEE International Electron Devices Meeting (IEDM)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":"{\"title\":\"Two-dimensional heterojunction interlayer tunnel FET (Thin-TFET): From theory to applications\",\"authors\":\"Mingda Li, R. Yan, D. Jena, H. Xing\",\"doi\":\"10.1109/IEDM.2016.7838451\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We review the conception and development of two-dimensional heterojunction interlayer field effect transistor (Thin-TFET), where a steep subthreshold swing (SS) and a high on-current are estimated theoretically. The Thin-TFET has been experimentally demonstrated using WSe2/SnSe2 stacked heterostructures, where the SS is mostly likely limited by the interfacial trap density of states and the parasitic MOSFET. Due to its vertical stacking structure, Thin-TFET intrinsically has a smaller gate-drain capacitance compared to the conventional lateral pin-TFET. In turn, this results in mitigated Miller Effect in Thin-TFET thus reducing dynamic energy dissipation in circuits.\",\"PeriodicalId\":186544,\"journal\":{\"name\":\"2016 IEEE International Electron Devices Meeting (IEDM)\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"15\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE International Electron Devices Meeting (IEDM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2016.7838451\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2016.7838451","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Two-dimensional heterojunction interlayer tunnel FET (Thin-TFET): From theory to applications
We review the conception and development of two-dimensional heterojunction interlayer field effect transistor (Thin-TFET), where a steep subthreshold swing (SS) and a high on-current are estimated theoretically. The Thin-TFET has been experimentally demonstrated using WSe2/SnSe2 stacked heterostructures, where the SS is mostly likely limited by the interfacial trap density of states and the parasitic MOSFET. Due to its vertical stacking structure, Thin-TFET intrinsically has a smaller gate-drain capacitance compared to the conventional lateral pin-TFET. In turn, this results in mitigated Miller Effect in Thin-TFET thus reducing dynamic energy dissipation in circuits.