用相互作用准带模型计算Si1−xSnx复合合金电子结构

M. Oda, Yukina Kuroda, Ayaka Kishi, Y. Shinozuka
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引用次数: 0

摘要

采用相互作用准带(IQB)模型研究了Si1-xSnx复合合金在锌闪锌矿结构中的能带结构。以前的IQB模型是为A1-xBxD等三元化合物半导体开发的。为了将IQB应用于Si1-xSnx,我们将IQB扩展到四元素化合物,并计算出虚拟合金的电子结构为Si1-xSnxSi1-ySny,其中x=y。利用sp3s*紧密结合理论对角化了一个20 × 20的非厄米哈密顿矩阵,得到了几个x的准能带结构。通过比较能带结构,我们发现Si1-xSnx在x = 0.39附近发生了间接-直接的间隙交叉。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electronic structures calculation of Si1−xSnx compound alloy using interacting quasi-band model
We investigate energy band structures of Si1-xSnx compound alloy in zincblende structure using interacting qasi-band (IQB) model. The previous IQB model has been developed for three element compound semiconductors such as A1-xBxD. To apply IQB for Si1-xSnx, we here extend the IQB for four element compounds and calculate the electronic structures of virtual alloy as Si1-xSnxSi1-ySny, where x=y. Diagonalizing a 20 × 20 non-Hermitian Hamiltonian matrix using sp3s* tight binding theory, we obtain quasi-band structures for several x. Comparing the band structures, we reveal that indirect-direct gap crossover in Si1-xSnx occurs around x = 0.39.
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