GSMBE半绝缘InP:Fe:最佳生长条件

S. Salaun, A. Le Corre, M. Gauneau, D. Lecrosnier
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引用次数: 1

摘要

作者利用二次离子质谱和电阻率测量研究了气源分子束外延(GSMBE) InP:Fe外延层的质量与生长条件的关系。改变生长温度和磷化氢(PH/sub 3/)流速可以控制生长过程中原子的表面迁移率,从而减少铁原子之间的相互作用,从而改善它们在InP层中的结合。在优化的生长条件下,证明了GSMBE InP:Fe外延层的半绝缘性能,电阻率超过10/sup / 8/ /spl ω /。铁浓度高于10/sup时,Cm为17/ Cm /sup -3/ >
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Semi-insulating InP:Fe by GSMBE: Optimal growth conditions
The authors studied the quality of gas source molecular beam epitaxy (GSMBE) InP:Fe epitaxial layers as a function of growth conditions using secondary ion mass spectroscopy and resistivity measurements. Varying the growth temperature and the phosphine (PH/sub 3/) flow rate allows control of the atom surface mobility during growth, hence permitting decrease of the interactions between iron atoms, to improve their incorporation in the InP layers. For optimized growth conditions, a semi-insulating behavior of GSMBE InP:Fe epitaxial layers is demonstrated with resistivities in excess of 10/sup 8/ /spl Omega/.cm for an iron concentration above 10/sup 17/ cm/sup -3/.<>
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