一种128GB/s高带宽内存(HBM)堆叠DRAM的TSV连接精确测量与修复电路

Dong-Uk Lee, Kyung Whan Kim, Kwan-Weon Kim, Kangseol Lee, S. Byeon, Jin-Hee Cho, H. Jin, S. K. Nam, Jaejin Lee, J. Chun, Sung-Joo Hong
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引用次数: 13

摘要

对于异构结构高带宽存储器(HBM) DRAM来说,保证TSV连接的可靠性是非常重要的。提出了一种类似于相关双采样法的TSV电流精确扫描修复方法。基于寄存器的预修复方法提高了可测试性。数千TSV的测量结果显示阻抗分布在0.1欧姆以下。方法采用29nm工艺集成在8Gb HBM堆叠DRAM中。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An exact measurement and repair circuit of TSV connections for 128GB/s high-bandwidth memory(HBM) stacked DRAM
For the heterogeneous-structured high bandwidth memory (HBM) DRAM, it is important to guarantee the reliability of TSV connections. An exact TSV current scan and repair method is proposed, that uses similar to the correlated double sampling method. The register-based pre-repair method improves testability. The measurement results for thousands of TSV shows impedance distribution under 0.1 ohm. Methods are integrated in 8Gb HBM stacked DRAM using 29nm process.
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