1.8 MeV质子辐照下AlxGa1−xN/GaN modfet的阴极发光光谱和电性能

M. Bataiev, L. Brillson
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引用次数: 0

摘要

利用阴极发光光谱(CLS)研究了1.8 mev质子辐照后掺AlGaN/GaN调制的场效应晶体管的源漏电流特性下降,以及场效应晶体管材料的体异质结。对于这两种情况,我们都观察到由于内部电场强度的降低和器件结构不同层内新的点缺陷而导致的光谱发射特征的明显变化,并且具有纳米级深度分辨率。这些变化可能是由于电特性的退化。测量了1.8 mev质子辐照下Al-GaN/GaN高电子迁移率晶体管在3·1014 cm-2辐照下的降解情况。该器件具有比AlGaN/GaN器件高得多的迁移率,但它们具有高的辐射耐受性,在高达1011 cm-2的影响下几乎没有退化。载流子散射增加导致的载流子迁移率降低和载流子去除导致的载流子密度降低是主要的损伤机制。器件的劣化表现为最大跨导减小,阈值电压增大,漏极饱和电流减小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Cathodoluminescent spectroscopy and electric properties of MODFETs of AlxGa1−xN/GaN at impact of proton irradiation 1.8 MeV
The cathodoluminescent spectroscopy (CLS) in order to examine AlGaN/GaN modulation-doped field-effect transistors that display degraded source-drain current characteristics after 1.8-MeV proton irradiation, along with bulk heterojunctions of materials of field-effect transistor. For both cases, we have observed distinct changes in the spectral emission features due to decreased internal electric-field strength and new point defects within different layers of the device structure with the nanometer-scale depth resolution. These changes might be accounted for the degraded electrical characteristics. The degradation of Al-GaN/GaN high electron mobility transistors due to 1.8-MeV proton irradiation was measured at fluence up to 3·1014 cm-2. The devices have much higher mobility than AlGaN/GaN devices, but they possess high radiation tolerance, exhibiting little degradation at fluence up to 1011 cm-2. Decreased sheet carrier mobility due to the increased carrier scattering and the decreased sheet carrier density due to the carrier removal are primary damage mechanisms. The device degradation has been observed with the decrease in the maximum transconductance, the increase in the threshold voltage, and the decrease in the drain saturation current.
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