浅层杂质对多层深层杂质稳态概率函数的影响

J.D. Puksec, V. Gradisnik
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引用次数: 0

摘要

加入到n型或p型半导体中的深层杂质被部分电离。用来描述占据深能级的概率函数是引入熵因子的费米-狄拉克函数;/spl chi//sub p/表示供体水平,/spl xi//sub n/表示受体水平。利用熵因子对计算值和实测值进行调整。根据深层能级的预测位置和得到的熵因子来定义有效深层能级。比较n型和p型硅中添加金和铂的计算值和实测值,我们可以看到,在n型和p型半导体中,相同的预测能级用完全不同的熵因子来描述。根据得到的深层有效能级的位置,可以得出结论,在浅层和深层杂质之间的补偿中,必须考虑最接近浅层的深层能级。其他层次是中性的。在n型半导体中,可能会发生铂的高受体能级被占据,而低受体能级为空的情况。似乎在n型中不存在这样的中性能级,而在p型中存在,并且被部分占据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of shallow impurity on steady-state probability function of multilevel deep impurity
The deep impurity added into the n- or p-type semiconductor is partially ionised. The probability function used to describe the occupation of a deep energy level, is the Fermi-Dirac function into which the entropy factor is introduced; /spl chi//sub p/ for donor level or /spl xi//sub n/ for acceptor level. The entropy factors are used to adjust the calculated and measured values. An effective deep energy level was defined depending on the predicted position of a deep level and on obtained entropy factor. Comparing the calculated and measured values for gold and platinum added into the n- and p-type silicon, we can see that the same predicted energy level is described with a quite different entropy factor in the n- and p-type semiconductor. According to the obtained positions of the effective deep energy levels, it can be concluded that in the compensation between shallow and deep impurity a deep level, which is nearest to the shallow level, must be considered. The other levels are neutral. It might happen that in the n-type semiconductor the higher acceptor level of platinum is occupied, while the lower one is empty. It seems that such a neutral energy level does not exist in the n-type, while in the p-type it does, and it is partially occupied.
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