{"title":"铸造平台高密度集成的反设计光子偏振控制","authors":"A. Khurana, J. Slaby, A. Hammond, S. Ralph","doi":"10.1109/SiPhotonics55903.2023.10141959","DOIUrl":null,"url":null,"abstract":"Compact, wideband structures to enable chip-scale polarization control are essential elements for large-scale integrated photonics. We experimentally validate inverse-designed polarization control structures fabricated on a commercial foundry, demonstrating rotator conversion efficiency of -1.5dB and splitter insertion losses of 1.4dB (TE) and 2.6dB (TM) across C-band.","PeriodicalId":105710,"journal":{"name":"2023 IEEE Silicon Photonics Conference (SiPhotonics)","volume":"69 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Inverse-Designed Photonic Polarization Control for High-Density Integration on Foundry Platforms\",\"authors\":\"A. Khurana, J. Slaby, A. Hammond, S. Ralph\",\"doi\":\"10.1109/SiPhotonics55903.2023.10141959\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Compact, wideband structures to enable chip-scale polarization control are essential elements for large-scale integrated photonics. We experimentally validate inverse-designed polarization control structures fabricated on a commercial foundry, demonstrating rotator conversion efficiency of -1.5dB and splitter insertion losses of 1.4dB (TE) and 2.6dB (TM) across C-band.\",\"PeriodicalId\":105710,\"journal\":{\"name\":\"2023 IEEE Silicon Photonics Conference (SiPhotonics)\",\"volume\":\"69 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 IEEE Silicon Photonics Conference (SiPhotonics)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SiPhotonics55903.2023.10141959\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE Silicon Photonics Conference (SiPhotonics)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SiPhotonics55903.2023.10141959","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Inverse-Designed Photonic Polarization Control for High-Density Integration on Foundry Platforms
Compact, wideband structures to enable chip-scale polarization control are essential elements for large-scale integrated photonics. We experimentally validate inverse-designed polarization control structures fabricated on a commercial foundry, demonstrating rotator conversion efficiency of -1.5dB and splitter insertion losses of 1.4dB (TE) and 2.6dB (TM) across C-band.
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