三维集成电路中模具键合凸点和焊盘的合法化研究

S. Pentapati, Anthony Agnesina, Moritz Brunion, Yen-Hsiang Huang, S. Lim
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引用次数: 0

摘要

最先进的3D集成电路放置和路由流程采用了较旧的技术节点和激进的键合间距假设。因此,这些流不能满足具有真实螺距值的3D通孔的宽度和间距规则。我们提出了一个关键的新的3D通过合法化阶段在路由,以减少此类违规。基于力的求解器和具有贝叶斯优化的双方匹配算法作为可行的法制化器提出,并与各种过程节点、粘合技术和分区类型兼容。通过改进的3D路由,我们将3D违规减少了10倍以上,对性能,功率或面积的影响为零。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On Legalization of Die Bonding Bumps and Pads for 3D ICs
State-of-the-art 3D IC Place-and-Route flows were designed with older technology nodes and aggressive bonding pitch assumptions. As a result, these flows fail to honor the width and spacing rules for the 3D vias with realistic pitch values. We propose a critical new 3D via legalization stage during routing to reduce such violations. A force-based solver and bipartite-matching algorithm with Bayesian optimization are presented as viable legalizers and are compatible with various process nodes, bonding technologies, and partitioning types. With the modified 3D routing, we reduce the 3D via violations by more than 10× with zero impact on performance, power, or area.
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