高压和超高压碳化硅器件技术进展

Y. Yonezawa, K. Nakayama, R. Kosugi, S. Harada, K. Koseki, K. Sakamoto, T. Kimoto, H. Okumura
{"title":"高压和超高压碳化硅器件技术进展","authors":"Y. Yonezawa, K. Nakayama, R. Kosugi, S. Harada, K. Koseki, K. Sakamoto, T. Kimoto, H. Okumura","doi":"10.1109/IEDM.2018.8614600","DOIUrl":null,"url":null,"abstract":"The current developments in silicon carbide (SiC) device technology in various voltage ranges are introduced. These developments correspond to, in particular, next-generation high to ultrahigh-voltage devices, SiC super-junction metal oxide semiconductor field effect transistors, SiC insulated gate bipolar transistors, and the fundamental bipolar degradation suppression technology. We expect that these next generation devices will trigger a paradigm shift in power electronics.","PeriodicalId":152963,"journal":{"name":"2018 IEEE International Electron Devices Meeting (IEDM)","volume":"150 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Progress in High and Ultrahigh Voltage Silicon Carbide Device Technology\",\"authors\":\"Y. Yonezawa, K. Nakayama, R. Kosugi, S. Harada, K. Koseki, K. Sakamoto, T. Kimoto, H. Okumura\",\"doi\":\"10.1109/IEDM.2018.8614600\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The current developments in silicon carbide (SiC) device technology in various voltage ranges are introduced. These developments correspond to, in particular, next-generation high to ultrahigh-voltage devices, SiC super-junction metal oxide semiconductor field effect transistors, SiC insulated gate bipolar transistors, and the fundamental bipolar degradation suppression technology. We expect that these next generation devices will trigger a paradigm shift in power electronics.\",\"PeriodicalId\":152963,\"journal\":{\"name\":\"2018 IEEE International Electron Devices Meeting (IEDM)\",\"volume\":\"150 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE International Electron Devices Meeting (IEDM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2018.8614600\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2018.8614600","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

介绍了不同电压范围碳化硅器件技术的最新进展。这些发展特别对应于下一代高至超高压器件,SiC超结金属氧化物半导体场效应晶体管,SiC绝缘栅双极晶体管以及基本的双极退化抑制技术。我们期望这些下一代设备将引发电力电子领域的范式转变。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Progress in High and Ultrahigh Voltage Silicon Carbide Device Technology
The current developments in silicon carbide (SiC) device technology in various voltage ranges are introduced. These developments correspond to, in particular, next-generation high to ultrahigh-voltage devices, SiC super-junction metal oxide semiconductor field effect transistors, SiC insulated gate bipolar transistors, and the fundamental bipolar degradation suppression technology. We expect that these next generation devices will trigger a paradigm shift in power electronics.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信