红外近场显微镜热成像

C. Feng, M. Unlu, B. Goldberg, W. Herzog
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引用次数: 4

摘要

散热是集成电路(IC)设计中的一个主要问题。绘制集成电路的温度分布对于检测制造和材料缺陷以及验证热模拟预测的温度分布具有非常重要的作用。我们描述了一种非侵入性,价格合理且易于维护的热成像系统,能够在正常操作条件下测量设备。我们的热成像系统的工作原理是基于近场扫描光学显微镜(NSOM)在红外热成像中的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermal imaging by infrared near-field microscopy
Heat dissipation is a major concern in integrated circuit (IC) design. Mapping the temperature distribution of ICs plays a very important role in detecting fabrication and material defects and also verifying the temperature distribution predicted by thermal simulations. We describe a non-invasive, affordable and easy to maintain thermal imaging system capable of measuring devices under normal operating conditions. The operating principle of our thermal imaging system is based on the application of near-field scanning optical microscopy (NSOM) to IR thermography.
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