{"title":"射频mosfet小信号模型的解析参数提取","authors":"Y.S. Chi, J. Lu, S.Y. Zhang, Z. Wu, F. Huang","doi":"10.1109/EDSSC.2005.1635332","DOIUrl":null,"url":null,"abstract":"An analytical method to directly extract the MOSFET small-signal model parameters including non-quais-static and substrate effect from S-parameter is presented. This method only relies on S-parameter measured in active region and is verified by RF MOSFET fabricated in 0.13 μm CMOS technology. Good agreement is obtained between the simulated results and the measured data up to 30 GHz.","PeriodicalId":429314,"journal":{"name":"2005 IEEE Conference on Electron Devices and Solid-State Circuits","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"An Analytical Parameter Extraction of the Small-Signal Model for RF MOSFETs\",\"authors\":\"Y.S. Chi, J. Lu, S.Y. Zhang, Z. Wu, F. Huang\",\"doi\":\"10.1109/EDSSC.2005.1635332\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An analytical method to directly extract the MOSFET small-signal model parameters including non-quais-static and substrate effect from S-parameter is presented. This method only relies on S-parameter measured in active region and is verified by RF MOSFET fabricated in 0.13 μm CMOS technology. Good agreement is obtained between the simulated results and the measured data up to 30 GHz.\",\"PeriodicalId\":429314,\"journal\":{\"name\":\"2005 IEEE Conference on Electron Devices and Solid-State Circuits\",\"volume\":\"45 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 IEEE Conference on Electron Devices and Solid-State Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDSSC.2005.1635332\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE Conference on Electron Devices and Solid-State Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDSSC.2005.1635332","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An Analytical Parameter Extraction of the Small-Signal Model for RF MOSFETs
An analytical method to directly extract the MOSFET small-signal model parameters including non-quais-static and substrate effect from S-parameter is presented. This method only relies on S-parameter measured in active region and is verified by RF MOSFET fabricated in 0.13 μm CMOS technology. Good agreement is obtained between the simulated results and the measured data up to 30 GHz.