C. Anghel, N. Hefyene, Renaud Gillon, M. Tack, Michel Declercq, Adrian M. Ionescu
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引用次数: 16
摘要
这项工作报告了高压(HV) dmosfet的自热效应(SHE)特性,以及该器件等效热阻抗(热阻R/sub TH/和电容C/sub TH/)的简单而准确的提取方法。通过系统的脉冲门实验,研究了脉冲持续时间和占空因子对器件SHE的影响以及最佳提取条件。研究发现,在100 V dmosfet中,使用持续时间小于2 /spl mu/s且占空比小于1:100的脉冲可以抵消SHE。新的提取方法利用了SHE随脉冲持续时间逐渐抵消的专用提取图,并验证了包含RTH温度依赖性的新的分析模型。我们首次报道了RTH的温度依赖性,从25/spl°C到150/spl°C,在DMOS的饱和和准饱和区域,这被证明是器件内部温度的准线性但重要的函数。此外,另一个新的结果是功率低依赖的热电容,正如我们的实验所表明的那样。最后,SPICE仿真验证了所提出的方法,并证明了热相关的热阻模型对于HV DMOS集成电路的精确高级仿真至关重要。
New method for temperature-dependent thermal resistance and capacitance accurate extraction in high-voltage DMOS transistors
This work reports on the self-heating-effect (SHE) characterization of high-voltage (HV) DMOSFETs and a simple yet accurate extraction methodology of the equivalent thermal impedance of the device (thermal resistance, R/sub TH/, and capacitance, C/sub TH/). Systematic pulsed-gate experiments are used to study the influence of pulse duration and duty factor on device SHE and optimal extraction conditions. It is found that in 100 V DMOSFETs, the SHE is cancelled by using pulses with duration shorter than 2 /spl mu/s and duty factors lower than 1:100. The new extraction method uses dedicated extraction plots exploiting the gradual canceling of SHE with pulse duration and a new analytical modeling including the temperature dependence of RTH, is validated. For the first time, we report on the temperature dependence of RTH, from 25/spl deg/C up to 150/spl deg/C, in both saturation and quasi-saturation regions of DMOS, which is shown to be a quasi-linear yet significant function of the device internal temperature. Moreover, another new result is a power low-dependent thermal capacitance, as suggested by our experiments. Finally, SPICE simulations are used to validate the proposed method, and, demonstrate that a thermal-dependent thermal resistance model is highly critical for accurate advanced simulation of HV DMOS ICs.