UDSM CMOS电路延迟的综合分析

J. Samanta, B. P. De
{"title":"UDSM CMOS电路延迟的综合分析","authors":"J. Samanta, B. P. De","doi":"10.1109/ICECCT.2011.6077064","DOIUrl":null,"url":null,"abstract":"In this paper, we have developed a simple and accurate delay model for any Ultra Deep Sub-micron (UDSM) CMOS inverter, NAND2 & NOR2 based on nth power law of MOSFET model when the channel length is of the order of less than or equal to 90nm. We have taken all the parameters from BSIM.4.6.1 manual. This work derives analytical expression for the delay model of a CMOS inverter including all sorts of secondary effects such as Body Bias effect, Channel Length Modulation Effect (CLM), Velocity Saturation effect, Drain Induced Barrier Lowering (DIBL), etc which may occur in the Ultra Deep Submicron MOS devices. We also extend our delay model for 2 input CMOS NAND and NOR gate. Our result is better than nth power law and Cadence (UMC90nm) simulation result with respect to both quality and estimation time. Our proposed model gives an average error of only 3.63% with compare to Cadence Simulation result.","PeriodicalId":158960,"journal":{"name":"2011 International Conference on Electronics, Communication and Computing Technologies","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Comprehensive analysis of delay in UDSM CMOS circuits\",\"authors\":\"J. Samanta, B. P. De\",\"doi\":\"10.1109/ICECCT.2011.6077064\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we have developed a simple and accurate delay model for any Ultra Deep Sub-micron (UDSM) CMOS inverter, NAND2 & NOR2 based on nth power law of MOSFET model when the channel length is of the order of less than or equal to 90nm. We have taken all the parameters from BSIM.4.6.1 manual. This work derives analytical expression for the delay model of a CMOS inverter including all sorts of secondary effects such as Body Bias effect, Channel Length Modulation Effect (CLM), Velocity Saturation effect, Drain Induced Barrier Lowering (DIBL), etc which may occur in the Ultra Deep Submicron MOS devices. We also extend our delay model for 2 input CMOS NAND and NOR gate. Our result is better than nth power law and Cadence (UMC90nm) simulation result with respect to both quality and estimation time. Our proposed model gives an average error of only 3.63% with compare to Cadence Simulation result.\",\"PeriodicalId\":158960,\"journal\":{\"name\":\"2011 International Conference on Electronics, Communication and Computing Technologies\",\"volume\":\"8 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-11-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 International Conference on Electronics, Communication and Computing Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICECCT.2011.6077064\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 International Conference on Electronics, Communication and Computing Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICECCT.2011.6077064","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8

摘要

在本文中,我们基于MOSFET模型的n次幂定律,在通道长度小于等于90nm的数量级下,建立了一个简单准确的延迟模型,适用于任何超深亚微米(UDSM) CMOS逆变器NAND2和NOR2。我们从BSIM.4.6.1手册中获取了所有参数。本文推导了包含超深亚微米MOS器件中可能出现的体偏置效应、信道长度调制效应(CLM)、速度饱和效应、漏极诱导势垒降低(DIBL)等各种次要效应的CMOS逆变器延迟模型的解析表达式。我们还扩展了2输入CMOS NAND和NOR门的延迟模型。我们的结果在质量和估计时间方面都优于n次幂律和Cadence (UMC90nm)的模拟结果。与Cadence仿真结果相比,该模型的平均误差仅为3.63%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comprehensive analysis of delay in UDSM CMOS circuits
In this paper, we have developed a simple and accurate delay model for any Ultra Deep Sub-micron (UDSM) CMOS inverter, NAND2 & NOR2 based on nth power law of MOSFET model when the channel length is of the order of less than or equal to 90nm. We have taken all the parameters from BSIM.4.6.1 manual. This work derives analytical expression for the delay model of a CMOS inverter including all sorts of secondary effects such as Body Bias effect, Channel Length Modulation Effect (CLM), Velocity Saturation effect, Drain Induced Barrier Lowering (DIBL), etc which may occur in the Ultra Deep Submicron MOS devices. We also extend our delay model for 2 input CMOS NAND and NOR gate. Our result is better than nth power law and Cadence (UMC90nm) simulation result with respect to both quality and estimation time. Our proposed model gives an average error of only 3.63% with compare to Cadence Simulation result.
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