3c碳化硅(SiC)的物理参数化,以评估该材料作为4h碳化硅替代品用于功率二极管的适用性

A. Arvanitopoulos, N. Lophitis, S. Perkins, Konstantinos N. Gyftakis, M. B. Guadas, Marina Antoniou
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引用次数: 19

摘要

碳化硅的立方多型,3C-SiC,加上其卓越的物理性能和低制造成本,最近的主要发展表明,在未来五年内,3C-SiC器件可以成为商业现实。因此,发展有限元方法(FEM)技术和模型对精确的器件仿真具有重要意义。此外,还需要执行详尽的模拟调查,以确定该多型适合哪种器件系列,哪种电压等级以及哪种应用。在本文中,我们提出了一套完整的物理模型和材料参数的大块3C-SiC瞄准技术计算机辅助设计(TCAD)工具。并与碳化硅最发达的多型碳化硅(4H-SiC)进行了比较。随后,新开发的材料参数被用于评估3C-和4H-SiC垂直功率二极管、P-i-N和肖特基势垒二极管(sbd),以创建导通状态电压降和阻塞能力相关的权衡图。根据应用程序施加的操作需求,开发的权衡映射为这两个多类型设置领域的边界。它还允许我们预测哪些应用将受益于电梯度3C-SiC功率二极管。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Physical parameterisation of 3C-Silicon Carbide (SiC) with scope to evaluate the suitability of the material for power diodes as an alternative to 4H-SiC
Major recent developments in growth expertise related to the cubic polytype of Silicon Carbide, the 3C-SiC, coupled with its remarkable physical properties and the low fabrication cost, suggest that within the next five years, 3C-SiC devices can become a commercial reality. It is therefore important to develop Finite Element Method (FEM) techniques and models for accurate device simulation. Furthermore, it is also needed to perform an exhaustive simulation investigation with scope to identify which family of devices, which voltage class and for which applications this polytype is suited. In this paper, we present a complete set of physical models and material parameters for bulk 3C-SiC aiming Technology Computer Aided Design (TCAD) tools. These are compared with those of 4H-SiC, the most well developed polytype of SiC. Thereafter, the newly developed material parameters are used to assess 3C- and 4H-SiC vertical power diodes, P-i-N and Schottky Barrier Diodes (SBDs), to create trade-off maps relating the on-state voltage drop and the blocking capability. Depending on the operation requirements imposed by the application, the developed trade-off maps set the boundary of the realm for those two polytypes. It also allows us to predict which applications will benefit from an electrically graded 3C-SiC power diodes.
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