纳米多栅极晶体管三维蒙特卡罗模拟的各向异性薛定谔方程量子修正

M. Elmessary, D. Nagy, M. Aldegunde, J. Lindberg, W. Dettmer, D. Peric, A. García-Loureiro, K. Kalna
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引用次数: 0

摘要

我们将基于各向异性薛定谔方程的二维量子修正(SEQC)结合到三维有限元(FE)蒙特卡罗(MC)模拟工具箱中。MC工具箱针对22 nm栅极长度GAA Si纳米线(NW)的实验ID-VG特性进行了测试,在低漏偏置和高漏偏置方面都表现出良好的一致性。然后,我们根据ITRS规范将Si GAA NW缩放到10 nm的栅极长度。为了显示各向异性QC对ID-VG特性的影响,我们模拟了两个8:1 nm栅极长度的finfet,矩形(REC)和三角形(TRI),通道方向为和< 100 >。QC各向异性效应在< 100 >通道的TRI器件中更为明显,使漏极电流增加约13%,而在< 100 >通道的REC器件中则略微减少2%。然而,QC各向异性对< 100 >方向的任何设备的影响都可以忽略不计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Anisotropic schrodinger equation quantum corrections for 3D Monte Carlo simulations of nanoscale multigate transistors
We incorporated anisotropic 2D Schrodinger equation based quantum corrections (SEQC) that depends on valley orientation into a 3D Finite Element (FE) Monte Carlo (MC) simulation toolbox. The MC toolbox was tested against experimental ID-VG characteristics of the 22 nm gate length GAA Si nanowire (NW) with excellent agreement at both low and high drain biases. We then scaled the Si GAA NW according to the ITRS specifications to a gate length of 10 nm. To show the effect of anisotropic QC on the ID-VG characteristics, we simulate two 8:1 nm gate length FinFETs, rectangular-like (REC) and triangular-like (TRI), with the <;100> and 〈100〉 channel orientations. The QC anisotropy effect is more pronounced in the 〈100〉 channel TRI device increasing the drain current by about 13% and slightly decreasing the current by 2% in the 〈100〉 channel REC device. However, the QC anisotropy has negligible effect in any device in the 〈100〉 orientation.
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