纳米线的新机遇

E. Bakkers, H. I. T. Hauge, A. Li, S. Assali, A. Dijkstra, R. Tucker, Y. Ren, S. Conesa‐Boj, M. Verheijen
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引用次数: 0

摘要

只提供摘要形式。Si的光发射将允许在主要电子平台技术中集成电子和光学功能,但由于Si的间接带隙,这是不可能的。本讲座将讨论两种不同的方法,利用纳米线的独特性质,实现硅基化合物的发光。在第一种途径中,本文着重于制备无缺陷的GeSn化合物。讨论了其生长机理,利用电子显微镜和原子探针层析成像技术研究了其结构性质,并研究了其随温度变化的光学性质。第二条路线集中于具有不同晶体结构的硅和锗。本文采用晶体结构转移的方法,以纤锌矿GaP为模板,外延生长出具有六方晶体结构的SiGe化合物。用这种方法可以生长出无缺陷的六方锗壳和锗浓度可调的分支。本文将讨论这些新晶体相的结构和光学性质。作者认为,这些新的三维外延纳米结构在集成硅技术的光学功能方面具有很大的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
New opportunities with nanowires
Summary form only given. Light emission from Si, would allow integration of electronic and optical functionality in the main electronics platform technology, but this has been impossible due to the indirect band gap of Si. This talk will discuss 2 different approaches, using unique properties of nanowires, to realize light emission from Si-based compounds. In the first route, the paper focuses on the fabrication of defect-free GeSn compounds. The growth mechanism is discussed, the structural properties are investigated by electron microscopy and atom probe tomography and the temperature dependent optical properties are studied. The second route concentrates on Si and Ge with a different crystal structure. Here, crystal structure transfer is employed, in which wurtzite GaP is used as a template to epitaxially grow SiGe compounds with the hexagonal crystal structure. With this method, defect free hexagonal SiGe shells and branches with tunable Ge concentration are gorwn. The structural and optical properties of these new crystal phases will be discussed. The author believes that these new 3-dimensional epitaxial nanostructures have great potential to integrate optical functionality in Si technology.
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