一种用于CMOS电路设计的新型漏功率降低技术

J. Chun, C. Y. Roger Chen
{"title":"一种用于CMOS电路设计的新型漏功率降低技术","authors":"J. Chun, C. Y. Roger Chen","doi":"10.1109/SOCDC.2010.5682957","DOIUrl":null,"url":null,"abstract":"Power consumption is now a major technical problem facing the CMOS circuits in deep submicron process. As process moves to finer technologies, leakage power significantly increases very rapidly due to the high transistor density, reduced voltage and oxide thickness. We first experimentally investigate existing low-power techniques and point out problems with them. We then propose a family of circuit types for low-power design centered around inserting controlling transistors between pull-up and pull down circuits as well as between pull-up circuits/pull down circuits and power/ground. We investigate the characteristics of proposed gate types in terms of ability to reduce power consumption and their associated delay overhead. In addition, several variations of drain gating are discussed. In the end, an overall procedure for low-power circuit design is proposed by intelligently mixing various proposed circuit types for gates in the circuits based upon gate criticality analysis. Extensive SPICE simulation results were reported using 45nm, 32nm and 22nm process technologies. Significant power reduction is achieved with zero or little increase in the critical path delay of the overall circuits.","PeriodicalId":380183,"journal":{"name":"2010 International SoC Design Conference","volume":"152 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"49","resultStr":"{\"title\":\"A novel leakage power reduction technique for CMOS circuit design\",\"authors\":\"J. Chun, C. Y. Roger Chen\",\"doi\":\"10.1109/SOCDC.2010.5682957\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Power consumption is now a major technical problem facing the CMOS circuits in deep submicron process. As process moves to finer technologies, leakage power significantly increases very rapidly due to the high transistor density, reduced voltage and oxide thickness. We first experimentally investigate existing low-power techniques and point out problems with them. We then propose a family of circuit types for low-power design centered around inserting controlling transistors between pull-up and pull down circuits as well as between pull-up circuits/pull down circuits and power/ground. We investigate the characteristics of proposed gate types in terms of ability to reduce power consumption and their associated delay overhead. In addition, several variations of drain gating are discussed. In the end, an overall procedure for low-power circuit design is proposed by intelligently mixing various proposed circuit types for gates in the circuits based upon gate criticality analysis. Extensive SPICE simulation results were reported using 45nm, 32nm and 22nm process technologies. Significant power reduction is achieved with zero or little increase in the critical path delay of the overall circuits.\",\"PeriodicalId\":380183,\"journal\":{\"name\":\"2010 International SoC Design Conference\",\"volume\":\"152 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"49\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 International SoC Design Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOCDC.2010.5682957\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 International SoC Design Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOCDC.2010.5682957","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 49

摘要

功耗是当前深亚微米工艺CMOS电路面临的主要技术难题。随着工艺向更精细的技术发展,由于晶体管密度高、电压降低和氧化物厚度减少,泄漏功率显着迅速增加。我们首先对现有的低功耗技术进行了实验研究,并指出了它们存在的问题。然后,我们提出了一系列用于低功耗设计的电路类型,其核心是在上拉和下拉电路之间以及上拉/下拉电路和电源/地之间插入控制晶体管。我们从降低功耗和相关延迟开销的能力方面研究了所提出的栅极类型的特性。此外,还讨论了几种漏门的变化。最后,基于栅极临界性分析,提出了一种将各种栅极电路类型智能混合的低功耗电路设计总体流程。广泛的SPICE模拟结果报告使用45nm, 32nm和22nm工艺技术。在整个电路的关键路径延迟为零或很少增加的情况下,实现了显著的功率降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A novel leakage power reduction technique for CMOS circuit design
Power consumption is now a major technical problem facing the CMOS circuits in deep submicron process. As process moves to finer technologies, leakage power significantly increases very rapidly due to the high transistor density, reduced voltage and oxide thickness. We first experimentally investigate existing low-power techniques and point out problems with them. We then propose a family of circuit types for low-power design centered around inserting controlling transistors between pull-up and pull down circuits as well as between pull-up circuits/pull down circuits and power/ground. We investigate the characteristics of proposed gate types in terms of ability to reduce power consumption and their associated delay overhead. In addition, several variations of drain gating are discussed. In the end, an overall procedure for low-power circuit design is proposed by intelligently mixing various proposed circuit types for gates in the circuits based upon gate criticality analysis. Extensive SPICE simulation results were reported using 45nm, 32nm and 22nm process technologies. Significant power reduction is achieved with zero or little increase in the critical path delay of the overall circuits.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信