频率高达110GHz的中介体tsv回路路径优化

B. Curran, K. Lang, I. Ndip, H. Potter
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引用次数: 0

摘要

具有硅通孔的硅中间层技术将在未来2.5D系统的发展中发挥重要作用。此外,这样的系统将具有高密度和实时计算要求,从而导致更小的尺寸和更高的比特率。本文对正常电阻率硅中具有3种不同回流配置的通硅通孔结构进行了建模和测量。结果表明,利用全波模拟技术进行预测建模可以预测和降低传输结构中的反射和衰减。在硅电导率为25 S/m的情况下,TSV结构在10GHz ~ 20GHz之间进入准tem模式,透射系数约为-3dB。根据结构设计的不同,传输系数在-5dB和-7dB之间减小。当结构进入准tem模式时,三种结构的反射系数最大达到-11dB。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimization of the return current paths of interposer TSVs for frequencies up to 110GHz
Silicon interposer technology with through-silicon-vias will play a significant role in the development of future 2.5D systems. Furthermore, such systems will have high density and real-time computing requirements, leading to smaller sizes and higher bit-rates. In this paper, through-silicon-via structures in normal resistivity silicon with 3 different return current configurations are modeled and measured. It is shown that reflections and attenuations in the transmission structure can be predicted and reduced with predictive modeling using full-wave simulation techniques. With a silicon conductivity of 25 S/m, the examined TSV structures enter the quasi-TEM mode between 10GHz and 20GHz with a transmission coefficient of ca. -3dB. The transmission coefficient decreases between -5dB and -7dB, depending on the design of the structure. Reflection coefficients for all three structures reaches a maximum of -11dB as the structure enters the quasi-TEM mode.
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