屏蔽PMR磁头记录中近、远磁道擦除与介质SUL磁导率的关系

G. Choe, A. Goncharov, F. Chu, P. Vanderheijden
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引用次数: 0

摘要

PMR记录中相邻或远迹擦除(ATE或FTE)会限制记录迹密度。在典型的PMR磁头设计中,在写极附近加一个屏蔽以增加写场梯度。然而,在写入过程中,屏蔽会导致额外的磁通路径,导致相邻磁道的擦除和误码率(BER)的下降。介质软底层(SUL)是磁通返回路径的一部分,其磁性能也会影响ATE的性能[1]。在这项研究中,我们报告了系统的实验和建模结果,即带环绕屏蔽(WAS)的PMR头的ATE和FTE行为与SUL渗透率和厚度的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Adjacent and far track erasure dependence on media SUL permeability in shielded PMR head recording
Adjacent or far track erasure (ATE or FTE) in PMR recording can limit the recording track density. In a typical PMR head design, a shield is added near to the write pole to increase the write field gradient. The shield, however, leads to an additional flux path during writing, resulting in the erasure of neighboring tracks and bit error rate (BER) degradation. The media soft underlayer (SUL) is a part of the flux return path and its magnetic properties can also affect the ATE performance [1]. In this study, we report on systematic experimental and modelling results of ATE and FTE behavior of a PMR head with a wrapped-around shield (WAS) as a function of the SUL permeability and thickness.
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