具有交替N/P缓冲器的无反弹RC-IGBT

Gaoqiang Deng, X. Luo, K. Zhou, Qingyuan He, Xinliang Ruan, Qing Liu, T. Sun, Bo Zhang
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引用次数: 20

摘要

提出了一种具有交变N+/P缓冲器(AB)的1200v级反向导电IGBT,并首次对其机理进行了研究。AB RC-IGBT具有交替掺杂N+和P区的缓冲层。AB和集电极之间有一部分n漂移区。在单极模式中,P缓冲层充当电子屏障,并迫使电子流过缓冲层和集电极之间的高阻n漂移区。因此,用30μm的相当小的单元间距抑制回跳。在阻塞状态下,P缓冲区已完全耗尽,而N+缓冲区尚未完全耗尽。因此,电场终止于缓冲层,保证了高BV。与传统RC-IGBT相比,在相同的正向导通电压降下,所提出的AB型RC-IGBT的关断损耗降低了20%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A snapback-free RC-IGBT with Alternating N/P buffers
A 1200V-class Reverse Conducting IGBT with Alternating N+/P Buffers (AB) is proposed and its mechanism is investigated for the first time. The AB RC-IGBT features a buffer layer with alternately doped N+ and P regions. The AB is separated from the collector by a part of N-drift region. The P buffer serves as the electron barrier during the unipolar mode and forces the electrons to flow through the high-resistance N-drift region between the buffer and the collector. Consequently, the snapback is suppressed with a fairly small cell pitch of 30μm. In the blocking state, the P buffer is fully depleted while the N+ buffer is not fully depleted yet. Therefore, the electric field terminates in the buffer layer and a high BV is ensured. The turn-off loss of the proposed AB RC-IGBT is reduced by 20% compared with that of the conventional RC-IGBT for the same forward on-state voltage drop.
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