膜转移印花高反射Si/SiO2 Bragg反射器

2015 IEEE Summer Topicals Meeting Series (SUM) Pub Date : 2015-07-13 DOI:10.1109/PHOSST.2015.7248261

Minkyu Cho, Jung‐Hun Seo, Jaeseong Lee, Deyin Zhao, Weidong Zhou, Z. Ma

{"title":"膜转移印花高反射Si/SiO2 Bragg反射器","authors":"Minkyu Cho, Jung‐Hun Seo, Jaeseong Lee, Deyin Zhao, Weidong Zhou, Z. Ma","doi":"10.1109/PHOSST.2015.7248261","DOIUrl":null,"url":null,"abstract":"High reflection Si/SiO2 quarter-wavelength Distributed Bragg Reflector (DBR) is reported. The structure is composed of alternate single crystal Si and thermally-grown SiO2. Si Nanomembrane (Si NM) transfer and subsequent thermal oxidation achieves high reflection throughout the broad IR spectrum.","PeriodicalId":349795,"journal":{"name":"2015 IEEE Summer Topicals Meeting Series (SUM)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-07-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High-reflection Si/SiO2 Bragg reflector via membrane transfer printing\",\"authors\":\"Minkyu Cho, Jung‐Hun Seo, Jaeseong Lee, Deyin Zhao, Weidong Zhou, Z. Ma\",\"doi\":\"10.1109/PHOSST.2015.7248261\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"High reflection Si/SiO2 quarter-wavelength Distributed Bragg Reflector (DBR) is reported. The structure is composed of alternate single crystal Si and thermally-grown SiO2. Si Nanomembrane (Si NM) transfer and subsequent thermal oxidation achieves high reflection throughout the broad IR spectrum.\",\"PeriodicalId\":349795,\"journal\":{\"name\":\"2015 IEEE Summer Topicals Meeting Series (SUM)\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-07-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE Summer Topicals Meeting Series (SUM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PHOSST.2015.7248261\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE Summer Topicals Meeting Series (SUM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PHOSST.2015.7248261","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

报道了高反射Si/SiO2四分之一波长分布式布拉格反射器(DBR)。该结构由交替的单晶Si和热生长SiO2组成。Si纳米膜(Si NM)转移和随后的热氧化在整个宽红外光谱中实现高反射。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

High-reflection Si/SiO2 Bragg reflector via membrane transfer printing

High reflection Si/SiO2 quarter-wavelength Distributed Bragg Reflector (DBR) is reported. The structure is composed of alternate single crystal Si and thermally-grown SiO2. Si Nanomembrane (Si NM) transfer and subsequent thermal oxidation achieves high reflection throughout the broad IR spectrum.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2015 IEEE Summer Topicals Meeting Series (SUM)

自引率

0.00%

发文量