各种SiO2的蚀刻

{"title":"各种SiO2的蚀刻","authors":"M. Miyashita, Tatsuhiro Yabune, H. Kikuyama, A. Teramoto, J. Takano","doi":"10.1201/9781420026863.CH4","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":224467,"journal":{"name":"Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing","volume":"153 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Etching of Various SiO2\",\"authors\":\"M. Miyashita, Tatsuhiro Yabune, H. Kikuyama, A. Teramoto, J. Takano\",\"doi\":\"10.1201/9781420026863.CH4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":224467,\"journal\":{\"name\":\"Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing\",\"volume\":\"153 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1201/9781420026863.CH4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1201/9781420026863.CH4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}