用于下一代电子投影光刻的3d打印非平面电子源

Alex Kachkine, C. Owens, A. Hart, L. Velásquez-García
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摘要

我们报道了第一个用于电子投影光刻(EPL)的非平面电子源。该设备由3D打印制造,可提供共聚焦发射,无需静电透镜即可实现聚焦和退焦。发射是通过凹形碟形底座产生的,凹形碟形底座上有一组碳纳米管(CNT)涂层的发射器,这些发射器与凹形提取器电极的孔对齐;两者都是通过还原光聚合3D打印制造的,并通过随后的涂层进行改性。原型器件的启动电压为500 V,峰值发射电流为300 μA/cm2,场增强系数为7.8×104 cm-1。运行中的器件的荧光屏成像表明,发射在空间上是均匀的。这种革命性的范例使紧凑型设计符合工业要求的下一代光刻系统的发射规格。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
3D-Printed, Non-Planar Electron Sources For Next-Generation Electron Projection Lithography
We report the first non-planar electron sources for electron projection lithography (EPL). Fabricated by 3D printing, the devices deliver confocal emission, achieving focusing and demagnification without needing electrostatic lenses. Emission is produced by a concave dish base with an array of carbon nanotube (CNT)-coated emitters aligned to the apertures of a concave extractor electrode; both are fabricated by vat photopolymerization 3D printing and modified by subsequent coatings. Our prototype device exhibits a startup voltage of 500 V, a peak emission current of 300 μA/cm2, and a field enhancement factor of 7.8×104 cm-1. Phosphor screen imaging of the devices in operation demonstrates that the emission is spatially uniform. This revolutionary paradigm enables compact design at industrially required emission specifications of next-generation lithography systems.
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