芯片内部ESD现象超出电路保护范围

C. Duvvury, R. Rountree, O. Adams
{"title":"芯片内部ESD现象超出电路保护范围","authors":"C. Duvvury, R. Rountree, O. Adams","doi":"10.1109/RELPHY.1988.23419","DOIUrl":null,"url":null,"abstract":"V/sub DD/-V/sub SS/ protection design considerations to meet MIL-STD requirements are discussed. Internal chip electrostatic-discharge (ESD) damage due to direct stress applied between V/sub DD/ and V/sub SS/ pins is illustrated, and possible solutions are discussed. It is shown that induced current paths can exist when outputs/inputs are stressed with respect to V/sub DD/ or V/sub SS/ stress, and if the internal layout is not carefully considered, the overall protection level can degrade. An unusual internal ESD phenomenon that was observed for I/O pins stressed with respect to V/sub DD/ is reported. The results show that there exists a window of threshold voltages where the I/O protection is not effective due to interaction with the internal chip layout.<<ETX>>","PeriodicalId":102187,"journal":{"name":"26th Annual Proceedings Reliability Physics Symposium 1988","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"88","resultStr":"{\"title\":\"Internal chip ESD phenomena beyond the protection circuit\",\"authors\":\"C. Duvvury, R. Rountree, O. Adams\",\"doi\":\"10.1109/RELPHY.1988.23419\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"V/sub DD/-V/sub SS/ protection design considerations to meet MIL-STD requirements are discussed. Internal chip electrostatic-discharge (ESD) damage due to direct stress applied between V/sub DD/ and V/sub SS/ pins is illustrated, and possible solutions are discussed. It is shown that induced current paths can exist when outputs/inputs are stressed with respect to V/sub DD/ or V/sub SS/ stress, and if the internal layout is not carefully considered, the overall protection level can degrade. An unusual internal ESD phenomenon that was observed for I/O pins stressed with respect to V/sub DD/ is reported. The results show that there exists a window of threshold voltages where the I/O protection is not effective due to interaction with the internal chip layout.<<ETX>>\",\"PeriodicalId\":102187,\"journal\":{\"name\":\"26th Annual Proceedings Reliability Physics Symposium 1988\",\"volume\":\"40 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1988-04-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"88\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"26th Annual Proceedings Reliability Physics Symposium 1988\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RELPHY.1988.23419\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"26th Annual Proceedings Reliability Physics Symposium 1988","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.1988.23419","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 88

摘要

讨论了满足MIL-STD要求的V/sub DD/-V/sub SS/保护设计考虑。由于V/sub DD/和V/sub SS/引脚之间施加的直接应力导致芯片内部静电放电(ESD)损坏,并讨论了可能的解决方案。结果表明,当输出/输入相对于V/sub DD/或V/sub SS/应力时,可能存在感应电流路径,如果内部布局不仔细考虑,则整体保护水平可能会降低。据报道,在I/O引脚相对于V/sub DD/受力时,观察到一种不寻常的内部ESD现象。结果表明,由于与内部芯片布局的相互作用,存在一个阈值电压窗口,在此窗口中I/O保护无效。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Internal chip ESD phenomena beyond the protection circuit
V/sub DD/-V/sub SS/ protection design considerations to meet MIL-STD requirements are discussed. Internal chip electrostatic-discharge (ESD) damage due to direct stress applied between V/sub DD/ and V/sub SS/ pins is illustrated, and possible solutions are discussed. It is shown that induced current paths can exist when outputs/inputs are stressed with respect to V/sub DD/ or V/sub SS/ stress, and if the internal layout is not carefully considered, the overall protection level can degrade. An unusual internal ESD phenomenon that was observed for I/O pins stressed with respect to V/sub DD/ is reported. The results show that there exists a window of threshold voltages where the I/O protection is not effective due to interaction with the internal chip layout.<>
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信