{"title":"芯片内部ESD现象超出电路保护范围","authors":"C. Duvvury, R. Rountree, O. Adams","doi":"10.1109/RELPHY.1988.23419","DOIUrl":null,"url":null,"abstract":"V/sub DD/-V/sub SS/ protection design considerations to meet MIL-STD requirements are discussed. Internal chip electrostatic-discharge (ESD) damage due to direct stress applied between V/sub DD/ and V/sub SS/ pins is illustrated, and possible solutions are discussed. It is shown that induced current paths can exist when outputs/inputs are stressed with respect to V/sub DD/ or V/sub SS/ stress, and if the internal layout is not carefully considered, the overall protection level can degrade. An unusual internal ESD phenomenon that was observed for I/O pins stressed with respect to V/sub DD/ is reported. The results show that there exists a window of threshold voltages where the I/O protection is not effective due to interaction with the internal chip layout.<<ETX>>","PeriodicalId":102187,"journal":{"name":"26th Annual Proceedings Reliability Physics Symposium 1988","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"88","resultStr":"{\"title\":\"Internal chip ESD phenomena beyond the protection circuit\",\"authors\":\"C. Duvvury, R. Rountree, O. Adams\",\"doi\":\"10.1109/RELPHY.1988.23419\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"V/sub DD/-V/sub SS/ protection design considerations to meet MIL-STD requirements are discussed. Internal chip electrostatic-discharge (ESD) damage due to direct stress applied between V/sub DD/ and V/sub SS/ pins is illustrated, and possible solutions are discussed. It is shown that induced current paths can exist when outputs/inputs are stressed with respect to V/sub DD/ or V/sub SS/ stress, and if the internal layout is not carefully considered, the overall protection level can degrade. An unusual internal ESD phenomenon that was observed for I/O pins stressed with respect to V/sub DD/ is reported. The results show that there exists a window of threshold voltages where the I/O protection is not effective due to interaction with the internal chip layout.<<ETX>>\",\"PeriodicalId\":102187,\"journal\":{\"name\":\"26th Annual Proceedings Reliability Physics Symposium 1988\",\"volume\":\"40 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1988-04-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"88\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"26th Annual Proceedings Reliability Physics Symposium 1988\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RELPHY.1988.23419\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"26th Annual Proceedings Reliability Physics Symposium 1988","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.1988.23419","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Internal chip ESD phenomena beyond the protection circuit
V/sub DD/-V/sub SS/ protection design considerations to meet MIL-STD requirements are discussed. Internal chip electrostatic-discharge (ESD) damage due to direct stress applied between V/sub DD/ and V/sub SS/ pins is illustrated, and possible solutions are discussed. It is shown that induced current paths can exist when outputs/inputs are stressed with respect to V/sub DD/ or V/sub SS/ stress, and if the internal layout is not carefully considered, the overall protection level can degrade. An unusual internal ESD phenomenon that was observed for I/O pins stressed with respect to V/sub DD/ is reported. The results show that there exists a window of threshold voltages where the I/O protection is not effective due to interaction with the internal chip layout.<>