利用传输门实现高性能SRAM单元

Joshika Sharma, S. Khandelwal, S. Akashe
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引用次数: 10

摘要

静态随机存储器(SRAM)在微处理器领域中扮演着重要的角色,但随着技术的纳米化,泄漏参数和延迟是SRAM单元最常见的问题,它基本上是为极低功耗应用而设计的。传输栅极用于进一步降低渗透在8T SRAM单元中的漏电流。采用传输门进行对比分析。本文提出了一种可变感知SRAM单元的设计方法。TG8T SRAM单元的拟议架构类似于标准6T SRAM单元,唯一的例外是它们具有取代接入通晶体管的完整传输门。本文研究了tg8write在0.7 V工作时漏电流229.2fA、漏功率297.4nW、延时20.92ns、信噪比4.77dB等不同参数。该结果在45纳米技术的cadence virtuoso工具上执行。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Implementation of High Performance SRAM Cell Using Transmission Gate
Static Random Access Memory (SRAM) plays a most substantial role in the microprocessor world, but as the technology is scaling down in nanometers, leakage parameters and delay are the most common problems for SRAM cell which is basically designed for very low power application. Transmission gate is used to further reduced leakage current penetrating in the 8T SRAM cell. Comparative analysis is performed by using transmission gate. This paper represents a method for design a variability aware SRAM cell. The proposed architecture of the TG8T SRAM cell is analogous to the standard 6T SRAM cell, the only exception is that they possess full transmission gates which replace an access pass transistor. The paper studies the different parameters of TG8Twrite operation at 0.7 V like leakage current is 229.2fA, leakage power is 297.4nW, delay is 20.92ns and SNR is 4.77dB. This result performs on the cadence virtuoso tool at 45nm technology.
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