高台阶覆盖互连印刷纳米颗粒

Hendrik Joost Van Ginkel, J. Romijn, S. Vollebregt, Guo Qi Zhang
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引用次数: 3

摘要

半导体封装中所用材料的日益多样化为实现良好的互连提供了挑战。特别是非常软的基材,如纸张和聚合物,以及非常硬的基材,如碳化硅,对线键合或垂直互连的形成提出了独特的挑战。因此需要补充技术。本文介绍了一种在模具顶部和侧面直接刻写金属轨迹的方法。它是基于火花烧蚀气溶胶打印过程完全在室温下进行,没有任何施加的力量。因此,它适合在柔软或温度敏感的基材上使用。打印的金属线由纯金纳米颗粒组成,不含表面活性剂或污染物,不需要任何进一步的固化、清洁或其他处理。该工艺在硅模具和纸上得到了演示,但理论上适用于各种衬底材料。它可以提供一种替代方法,在柔软材料、温度敏感材料、不规则形状材料或曲面上创建互连或过孔。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High Step Coverage Interconnects By Printed Nanoparticles
The growing diversity in the used materials in semiconductor packaging provides challenges for achieving good interconnection. Particularly the very soft substrates, such as paper and polymers, and very hard, such as silicon carbide, offer unique challenges to wire-bonding or formation of vertical interconnects. Complementary technologies are therefore needed. Here, a method to direct-write metal tracks on the top and sides of dies is demonstrated. It is based on a spark ablation aerosol printing process entirely performed at room temperature and without any applied force. Therefore, it is suitable for use on soft or temperature-sensitive substrates. The printed metal lines consist of pure Au nanoparticles, without surfactants or contaminants, and do not require any further curing, cleaning, or other processing. The process is demonstrated on Si dies and paper, but is theoretically applicable on a wide variety of substrate materials. It can provide an alternative method to create interconnects or vias on soft materials, temperature sensitive materials, irregularly shaped materials, or curved surfaces.
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