16.9 A 128kb 4b/cell非易失性存储器,晶体In-Ga-Zn氧化物场效应晶体管采用Vt,取消写入方法

T. Matsuzaki, T. Onuki, S. Nagatsuka, H. Inoue, T. Ishizu, Y. Ieda, Naoto Yamade, H. Miyairi, M. Sakakura, T. Atsumi, Y. Shionoiri, K. Kato, T. Okuda, Yoshitaka Yamamoto, Masahiro Fujita, J. Koyama, S. Yamazaki
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引用次数: 0

摘要

随着连接到Internet的设备数量的增加,服务器和移动设备必须处理越来越大的数据量,并适应对高速和大容量工作内存不断增长的需求,以保持低功耗。电阻式RAM、相变RAM和MRAM[1]等新兴器件正在满足这一需求,这些器件实现了高速、高密度和非易失性存储器,显著提高了集成存储器cpu的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
16.9 A 128kb 4b/cell nonvolatile memory with crystalline In-Ga-Zn oxide FET using Vt, cancel write method
As the number of devices connected to the Internet increases, servers and mobile devices must process increasingly large volumes of data, and also accommodate the increasing demand for high-speed and large-capacity working memory keeping the power consumption low. This need is being fulfilled by emerging devices, such as resistive RAM, phase-change RAM, and MRAM [1], which realize high-speed, high-density and nonvolatile memory, significantly enhancing the performance of CPUs with integrated memories.
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