用于低能x射线和极紫外线的多层反射镜和光学

T. Barbee
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引用次数: 0

摘要

在过去的十年中,已经发展了足以应用于x射线和极紫外色散元件和光学器件的多层结构的合成技术。物理气相沉积技术已被应用于两种材料的连续沉积层,其光学常数适合于感兴趣的光谱范围。这些层具有极高的均匀性,厚度从小于1纳米到100纳米不等。这项工作是在Dumand和younz的早期努力以及Dinkledge和Frericks的工作之后进行的。最近,斯皮勒和他的同事一直致力于开发正入射多层反射镜,专门用于低能x射线域。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Multilayer Mirrors and Optics for Low Energy X-Ray and Extreme Ultraviolet Regimes
During the past decade techniques for the synthesis of multilayer structures of quality sufficient for application as x-ray and extreme ultraviolet dispersion elements and optic devices have been developed. Physical vapor deposition techniques have been applied to the sequential deposition of layers of two materials having optical constants appropriate for the spectral range of interest. These layers are of extremely high uniformity and vary in thickness from less than 1 nanometer to 100 nanometers. This work follows the early efforts of Dumand and Youtz and the work of Dinkledge and Frericks. More recently Spiller and his coworkers have been working on the development of normal incidence multilayer mirrors specifically for the low energy x-ray domains.
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