带开放缺陷的硅通孔粘接后测试

R. Rodríguez-Montañés, D. Arumí, J. Figueras
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引用次数: 18

摘要

硅通孔(tsv)是三维集成电路(3-D ic)中的关键元件,在其自身制造、键合阶段或其使用寿命等不同阶段都容易发生缺陷。典型的缺陷是微孔、欠填充、错位、氧化物中的针孔或键合过程中的错位,这些缺陷使得电阻打开成为影响tsv的常见失效机制。尽管有相当多的研究致力于改进tsv测试,但对弱缺陷,特别是引起小延迟的弱开放缺陷(电阻开放)的关注并不多。本文提出了一种基于键后振荡检测的小延迟缺陷检测策略。在不平衡逻辑门后传输信号的占空比的变化被显示为检测tsv中的弱开放缺陷。包括工艺参数变化的HSPICE模拟表明,该方法在检测1 kΩ以上的弱开放缺陷方面是有效的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Post-bond test of Through-Silicon Vias with open defects
Through Silicon Vias (TSVs) are critical elements in three dimensional integrated circuits (3-D ICs) and are susceptible to undergo defects at different stages: during their own fabrication, the bonding stage or during their life time. Typical defects are microvoids, underfilling, misalignement, pinholes in the oxide or misalignments during bonding in such a way that resistive opens become a frequent failure mechanism affecting TSVs. Although there is considerable research effort dedicated to improve TSVs testing, no much attention has been paid to weak defects, especially to weak open defects (resistive opens) causing small delays. In this work, a testing strategy is proposed to detect small delay defects by means of a post-bond oscillation test. Variations in the Duty Cycle of transmitted signals after unbalanced logic gates are shown to detect weak open defects in TSVs. HSPICE simulations including process parameter variations show the effectiveness of the method in the detection of weak open defects above 1 kΩ.
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