λ=1.3µm和λ=1.55µm时p-i-n和n-p-n硅相位调制器的自由载流子吸收损耗

A. Hanim, H. Hazura, B. Mardiana, P. Menon
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引用次数: 0

摘要

本文报道了与硅相位调制器有关的自由载流子吸收损耗。比较了两种结构:p-i-n和n-p-n结构。仿真是利用二维半导体仿真软件包SILVACO实现的。模拟预测,就自由载流子吸收损失而言,这两种结构在1.3 μ m时更有效地工作。在1.3µm处,p-i-n结构的自由载流子吸收损耗为0.1149 dB, n-p-n结构的自由载流子吸收损耗为0.3956 dB。在结构方面,由于额外的掺杂接触,与p-i-n结构相比,n-p-n硅相位调制器经历了更多的自由载流子吸收损失。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Free carrier absorption loss on p-i-n and n-p-n silicon phase modulator at λ=1.3µm and λ=1.55µm
The paper reports on the free carrier absorption loss associated with silicon phase modulator. Two structures are compared: p-i-n and n-p-n structure. The simulations are realized utilizing the 2-D semiconductor simulation package SILVACO. Simulations predict that both structures operate more efficiently at 1.3 µm in terms of free carrier absorption loss. At 1.3 µm, the calculated free carrier absorption loss for p-i-n structure is 0.1149 dB, while n-p-n structure suffers 0.3956 dB of loss. Structure-wise, n-p-n silicon phase modulator experience more free carrier absorption loss compared to p-i-n structure due to extra doping contact.
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