压力平衡以减轻寄存器文件中的NBTI影响

H. Amrouch, T. Ebi, J. Henkel
{"title":"压力平衡以减轻寄存器文件中的NBTI影响","authors":"H. Amrouch, T. Ebi, J. Henkel","doi":"10.1109/DSN.2013.6575315","DOIUrl":null,"url":null,"abstract":"Negative Bias Temperature Instability (NBTI) is considered one of the major reliability concerns of transistors in current and upcoming technology nodes and a main cause of their diminished lifetime. We propose a new means to mitigate the effects of NBTI on SRAM-based register files, which are particularly vulnerable due to their small structure size and are under continuous voltage stress for prolonged intervals. The conducted results from our technology simulator demonstrate the severity of NBTI effects on the SRAM cells - especially when process variation is taken into account. Based on the presented analysis, we show that NBTI stress in different registers needs to be tackled using different strategies corresponding to their access patterns. To this end, we propose to selectively increase the resilience of individual registers against NBTI. Our technique balances the gate voltage stress of the two PMOS transistors of an SRAM cell such that both are under stress for approximately the same amount of time during operation - thereby minimizing the deleterious effects of NBTI. We present mitigation implementations in both hardware and in software along with the incurred overhead. Through a wide range of applications we can show that our technique reduces the NBTI-induced reliability degradation by 35% on average. This is 22% better than current State-of-the-Art.","PeriodicalId":163407,"journal":{"name":"2013 43rd Annual IEEE/IFIP International Conference on Dependable Systems and Networks (DSN)","volume":"129 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"35","resultStr":"{\"title\":\"Stress balancing to mitigate NBTI effects in register files\",\"authors\":\"H. Amrouch, T. Ebi, J. Henkel\",\"doi\":\"10.1109/DSN.2013.6575315\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Negative Bias Temperature Instability (NBTI) is considered one of the major reliability concerns of transistors in current and upcoming technology nodes and a main cause of their diminished lifetime. We propose a new means to mitigate the effects of NBTI on SRAM-based register files, which are particularly vulnerable due to their small structure size and are under continuous voltage stress for prolonged intervals. The conducted results from our technology simulator demonstrate the severity of NBTI effects on the SRAM cells - especially when process variation is taken into account. Based on the presented analysis, we show that NBTI stress in different registers needs to be tackled using different strategies corresponding to their access patterns. To this end, we propose to selectively increase the resilience of individual registers against NBTI. Our technique balances the gate voltage stress of the two PMOS transistors of an SRAM cell such that both are under stress for approximately the same amount of time during operation - thereby minimizing the deleterious effects of NBTI. We present mitigation implementations in both hardware and in software along with the incurred overhead. Through a wide range of applications we can show that our technique reduces the NBTI-induced reliability degradation by 35% on average. This is 22% better than current State-of-the-Art.\",\"PeriodicalId\":163407,\"journal\":{\"name\":\"2013 43rd Annual IEEE/IFIP International Conference on Dependable Systems and Networks (DSN)\",\"volume\":\"129 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"35\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 43rd Annual IEEE/IFIP International Conference on Dependable Systems and Networks (DSN)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DSN.2013.6575315\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 43rd Annual IEEE/IFIP International Conference on Dependable Systems and Networks (DSN)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DSN.2013.6575315","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 35

摘要

负偏置温度不稳定性(NBTI)被认为是当前和未来技术节点中晶体管可靠性的主要问题之一,也是导致其寿命缩短的主要原因。我们提出了一种新的方法来减轻NBTI对基于sram的寄存器文件的影响,这些寄存器文件由于结构尺寸小且长时间处于连续电压应力下而特别脆弱。从我们的技术模拟器中进行的结果表明NBTI对SRAM单元的影响的严重性-特别是当考虑到工艺变化时。在此基础上,我们发现不同寄存器的NBTI应力需要采用不同的策略来解决。为此,我们建议选择性地增加单个寄存器对NBTI的弹性。我们的技术平衡了SRAM单元的两个PMOS晶体管的栅极电压应力,使它们在工作期间处于应力状态的时间大致相同,从而最大限度地减少了NBTI的有害影响。我们介绍了硬件和软件方面的缓解实现以及产生的开销。通过广泛的应用,我们可以证明我们的技术可以将nbti引起的可靠性下降平均降低35%。这比目前最先进的技术好22%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Stress balancing to mitigate NBTI effects in register files
Negative Bias Temperature Instability (NBTI) is considered one of the major reliability concerns of transistors in current and upcoming technology nodes and a main cause of their diminished lifetime. We propose a new means to mitigate the effects of NBTI on SRAM-based register files, which are particularly vulnerable due to their small structure size and are under continuous voltage stress for prolonged intervals. The conducted results from our technology simulator demonstrate the severity of NBTI effects on the SRAM cells - especially when process variation is taken into account. Based on the presented analysis, we show that NBTI stress in different registers needs to be tackled using different strategies corresponding to their access patterns. To this end, we propose to selectively increase the resilience of individual registers against NBTI. Our technique balances the gate voltage stress of the two PMOS transistors of an SRAM cell such that both are under stress for approximately the same amount of time during operation - thereby minimizing the deleterious effects of NBTI. We present mitigation implementations in both hardware and in software along with the incurred overhead. Through a wide range of applications we can show that our technique reduces the NBTI-induced reliability degradation by 35% on average. This is 22% better than current State-of-the-Art.
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