{"title":"射频应用的高q多对多电容设计","authors":"Jin-Taek Lee, Jeongki Choi, Sang-Gug Lee","doi":"10.1109/ICMMT.2000.895655","DOIUrl":null,"url":null,"abstract":"A very high-Q poly-to-poly capacitor structure and the measurement results are presented. The poly-to-poly capacitor is designed on a conventional 0.35 /spl mu/m CMOS process. Through the layout optimization, a Q-factor greater than 120 is obtained at 2 GHz.","PeriodicalId":354225,"journal":{"name":"ICMMT 2000. 2000 2nd International Conference on Microwave and Millimeter Wave Technology Proceedings (Cat. No.00EX364)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"High-Q poly-to-poly capacitor design for RF applications\",\"authors\":\"Jin-Taek Lee, Jeongki Choi, Sang-Gug Lee\",\"doi\":\"10.1109/ICMMT.2000.895655\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A very high-Q poly-to-poly capacitor structure and the measurement results are presented. The poly-to-poly capacitor is designed on a conventional 0.35 /spl mu/m CMOS process. Through the layout optimization, a Q-factor greater than 120 is obtained at 2 GHz.\",\"PeriodicalId\":354225,\"journal\":{\"name\":\"ICMMT 2000. 2000 2nd International Conference on Microwave and Millimeter Wave Technology Proceedings (Cat. No.00EX364)\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ICMMT 2000. 2000 2nd International Conference on Microwave and Millimeter Wave Technology Proceedings (Cat. No.00EX364)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMMT.2000.895655\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMMT 2000. 2000 2nd International Conference on Microwave and Millimeter Wave Technology Proceedings (Cat. No.00EX364)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMMT.2000.895655","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
摘要
给出了一种非常高q的聚对聚电容结构及其测量结果。该多对多电容器采用传统的0.35 /spl μ m CMOS工艺设计。通过优化布局,在2ghz时获得了大于120的q因子。
High-Q poly-to-poly capacitor design for RF applications
A very high-Q poly-to-poly capacitor structure and the measurement results are presented. The poly-to-poly capacitor is designed on a conventional 0.35 /spl mu/m CMOS process. Through the layout optimization, a Q-factor greater than 120 is obtained at 2 GHz.